{"title":"在片上射频螺旋电感器的上方和下方结合了域图像化的坡莫合金","authors":"Vasu Pulijala, Syed Azeemuddin","doi":"10.1109/IMARC.2015.7411428","DOIUrl":null,"url":null,"abstract":"This paper discusses the effects of domain patterned Permalloy incorporated above and below on-chip planar spiral inductors. There is an improvement of 35% in inductance and 135% in quality factor compared to the control structure.","PeriodicalId":307742,"journal":{"name":"2015 IEEE MTT-S International Microwave and RF Conference (IMaRC)","volume":"23 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Domain patterned permalloy incorporated above and below on-chip RF spiral inductors\",\"authors\":\"Vasu Pulijala, Syed Azeemuddin\",\"doi\":\"10.1109/IMARC.2015.7411428\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper discusses the effects of domain patterned Permalloy incorporated above and below on-chip planar spiral inductors. There is an improvement of 35% in inductance and 135% in quality factor compared to the control structure.\",\"PeriodicalId\":307742,\"journal\":{\"name\":\"2015 IEEE MTT-S International Microwave and RF Conference (IMaRC)\",\"volume\":\"23 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2015-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2015 IEEE MTT-S International Microwave and RF Conference (IMaRC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IMARC.2015.7411428\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 IEEE MTT-S International Microwave and RF Conference (IMaRC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMARC.2015.7411428","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
This paper discusses the effects of domain patterned Permalloy incorporated above and below on-chip planar spiral inductors. There is an improvement of 35% in inductance and 135% in quality factor compared to the control structure.
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