S. Natarajan, C. Parker, J. Glass, C. Bower, K. Gilchrist, J. Piascik, B. Stoner
{"title":"用于完全集成的片上真空电子器件的高压MEMS平台","authors":"S. Natarajan, C. Parker, J. Glass, C. Bower, K. Gilchrist, J. Piascik, B. Stoner","doi":"10.1109/IVELEC.2008.4556325","DOIUrl":null,"url":null,"abstract":"We demonstrate a fully integrated, on-chip, vacuum microtriode capable of handling voltages up to 800 V. The ability to operate at such high voltages is achieved by the addition of a 10 mum-thick silicon dioxide layer to the device. The device is fabricated using MEMS fabrication principles and utilizes carbon nanotubes as field emitters. A dc amplification factor of 600 was obtained. To the best of our knowledge, this is the highest value reported for CNT-enabled microtriode devices. The high voltage capability of these microscale devices will enable their use in a wider variety of applications such as miniature ion sources and x-ray sources.","PeriodicalId":113971,"journal":{"name":"2008 IEEE International Vacuum Electronics Conference","volume":"27 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-04-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"High voltage MEMS platform for fully integrated, on-chip, vacuum electronic devices\",\"authors\":\"S. Natarajan, C. Parker, J. Glass, C. Bower, K. Gilchrist, J. Piascik, B. Stoner\",\"doi\":\"10.1109/IVELEC.2008.4556325\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We demonstrate a fully integrated, on-chip, vacuum microtriode capable of handling voltages up to 800 V. The ability to operate at such high voltages is achieved by the addition of a 10 mum-thick silicon dioxide layer to the device. The device is fabricated using MEMS fabrication principles and utilizes carbon nanotubes as field emitters. A dc amplification factor of 600 was obtained. To the best of our knowledge, this is the highest value reported for CNT-enabled microtriode devices. The high voltage capability of these microscale devices will enable their use in a wider variety of applications such as miniature ion sources and x-ray sources.\",\"PeriodicalId\":113971,\"journal\":{\"name\":\"2008 IEEE International Vacuum Electronics Conference\",\"volume\":\"27 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2008-04-22\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2008 IEEE International Vacuum Electronics Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IVELEC.2008.4556325\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2008 IEEE International Vacuum Electronics Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IVELEC.2008.4556325","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
High voltage MEMS platform for fully integrated, on-chip, vacuum electronic devices
We demonstrate a fully integrated, on-chip, vacuum microtriode capable of handling voltages up to 800 V. The ability to operate at such high voltages is achieved by the addition of a 10 mum-thick silicon dioxide layer to the device. The device is fabricated using MEMS fabrication principles and utilizes carbon nanotubes as field emitters. A dc amplification factor of 600 was obtained. To the best of our knowledge, this is the highest value reported for CNT-enabled microtriode devices. The high voltage capability of these microscale devices will enable their use in a wider variety of applications such as miniature ion sources and x-ray sources.