用于完全集成的片上真空电子器件的高压MEMS平台

S. Natarajan, C. Parker, J. Glass, C. Bower, K. Gilchrist, J. Piascik, B. Stoner
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引用次数: 4

摘要

我们展示了一个完全集成的片上真空微三极管,能够处理高达800 V的电压。在如此高的电压下工作的能力是通过在器件上添加10 μ m厚的二氧化硅层来实现的。该器件采用MEMS制造原理,利用碳纳米管作为场发射源。得到了600的直流放大系数。据我们所知,这是cnt微三极管器件报道的最高值。这些微型器件的高电压能力将使它们能够在更广泛的应用中使用,例如微型离子源和x射线源。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High voltage MEMS platform for fully integrated, on-chip, vacuum electronic devices
We demonstrate a fully integrated, on-chip, vacuum microtriode capable of handling voltages up to 800 V. The ability to operate at such high voltages is achieved by the addition of a 10 mum-thick silicon dioxide layer to the device. The device is fabricated using MEMS fabrication principles and utilizes carbon nanotubes as field emitters. A dc amplification factor of 600 was obtained. To the best of our knowledge, this is the highest value reported for CNT-enabled microtriode devices. The high voltage capability of these microscale devices will enable their use in a wider variety of applications such as miniature ion sources and x-ray sources.
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