质子深度光刻:折射微光学模组制造的通用技术

2000 IEEE/LEOS International Conference on Optical MEMS (Cat. No.00EX399) Pub Date : 2000-08-21 DOI:10.1109/OMEMS.2000.879647

B. Volckaerts, H. Ottevaere, A. Vilà, M. Muruzábal, C. Debaes, P. Vynck, P. Tuteleers, V. Baukens, A. Hermanne, I. Veretennicoff, H. Thienpont

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引用次数: 13

摘要

我们提出了最先进的质子深度光刻技术，作为专门用于制造21/2D和3D微光机械系统的候选技术。它的概念与LIGA非常相似，但使用离子而不是电磁辐射来构造和塑造PMMA板。我们采纳了这一理念，并对其实际实施进行了彻底升级，使其成为一项高质量的日常可重复性mom技术，并不断提高其性能，扩大其实际应用范围。

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Deep lithography with protons: a generic technology for the fabrication of refractive micro-optical modules

We present the state-of-the-art of deep lithography with protons as a candidate technology dedicated to the fabrication of 21/2D and 3D micro-opto-mechanical systems. Its concept is very similar to that of LIGA, but uses ions rather than electromagnetic radiation to structure and shape PMMA plates. We adopted the concept, thoroughly upgraded its practical implementation, turned it into a high-quality day-to-day reproducible MOMS technology and are continuously improving its performance and extending its range of practical application.

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2000 IEEE/LEOS International Conference on Optical MEMS (Cat. No.00EX399)

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