弯曲耦合器的宽FSR绝缘体上硅微环谐振器

2015 IEEE 12th International Conference on Group IV Photonics (GFP) Pub Date : 2015-10-26 DOI:10.1109/GROUP4.2015.7305966

N. Eid, Hasilha Jayatilleka, M. Caverley, S. Shekhar, L. Chrostowski, N. Jaeger

{"title":"弯曲耦合器的宽FSR绝缘体上硅微环谐振器","authors":"N. Eid, Hasilha Jayatilleka, M. Caverley, S. Shekhar, L. Chrostowski, N. Jaeger","doi":"10.1109/GROUP4.2015.7305966","DOIUrl":null,"url":null,"abstract":"This work demonstrates a silicon-on-insulator microring resonator with a 2.75 μm radius, fabricated using 248 nm optical lithography, that employs bent couplers and achieves a 33.4 nm FSR and a 3-dB bandwidth of 25 GHz.","PeriodicalId":244331,"journal":{"name":"2015 IEEE 12th International Conference on Group IV Photonics (GFP)","volume":"23 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-10-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Wide FSR silicon-on-insulator microring resonator with bent couplers\",\"authors\":\"N. Eid, Hasilha Jayatilleka, M. Caverley, S. Shekhar, L. Chrostowski, N. Jaeger\",\"doi\":\"10.1109/GROUP4.2015.7305966\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This work demonstrates a silicon-on-insulator microring resonator with a 2.75 μm radius, fabricated using 248 nm optical lithography, that employs bent couplers and achieves a 33.4 nm FSR and a 3-dB bandwidth of 25 GHz.\",\"PeriodicalId\":244331,\"journal\":{\"name\":\"2015 IEEE 12th International Conference on Group IV Photonics (GFP)\",\"volume\":\"23 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2015-10-26\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2015 IEEE 12th International Conference on Group IV Photonics (GFP)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/GROUP4.2015.7305966\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 IEEE 12th International Conference on Group IV Photonics (GFP)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/GROUP4.2015.7305966","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 1

摘要

这项工作展示了一个半径为2.75 μm的绝缘体上硅微环谐振器，采用248 nm光学光刻技术制造，采用弯曲耦合器，实现了33.4 nm的FSR和25 GHz的3db带宽。

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Wide FSR silicon-on-insulator microring resonator with bent couplers

This work demonstrates a silicon-on-insulator microring resonator with a 2.75 μm radius, fabricated using 248 nm optical lithography, that employs bent couplers and achieves a 33.4 nm FSR and a 3-dB bandwidth of 25 GHz.

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来源期刊

2015 IEEE 12th International Conference on Group IV Photonics (GFP)

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