SOI技术中的SDR双工滤波器

M. Pourakbar, Raheleh Eslampanah, M. Faulkner, Markus Törmänen, H. Sjöland
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引用次数: 1

摘要

软件定义无线电(SDR)手机必须覆盖不同分频双工距离的多个频段。这需要一个自适应双工器,它需要一个低隔离装置来创建初始隔离。该器件采用130 nm绝缘体上硅(SOI)工艺实现。其性能得益于高q层压PCB电感,其测量电感和q因子在2 GHz时分别为1.19 nH和125。可调谐低隔离装置在每个目标四个LTE频段的发射和接收频率上提供超过30 dB的隔离。在LTE频段i中,从PA到天线的插入损耗低于2db,所实现的电路占地2.4 mm2。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
An SDR duplex filter in SOI technology
A Software-Defined Radio (SDR) mobile handset must cover multiple frequency bands with different frequency division duplex distances. This calls for an adaptive duplexer, which needs a low-isolation device to create an initial isolation. Such a device is implemented in a 130 nm Silicon-on-Insulator (SOI) process. Its performance benefits from a high-Q laminated PCB inductor which has a measured inductance and Q-factor at 2 GHz of 1.19 nH and 125, respectively. The tunable low-isolation device provides an isolation exceeding 30 dB at both transmit and receive frequencies of each targeted four LTE frequency bands. The insertion loss from PA to antenna is below 2 dB in LTE band I. The implemented circuit occupies an area of 2.4 mm2.
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