Ta2O5 MIM和MIS电容器泄漏电流随时间的变化

J. Manceau, S. Bruyère, S. Jeannot, A. Sylvestre, P. Gonon
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引用次数: 14

摘要

本文采用电流随时间的测量方法和低频介电光谱法研究了不同样品厚度下MIM和MIS电容器中Ta2O5电流的不稳定性。确定了三种类型的现象:极化电流(归因于介电松弛现象),传导电流(归因于普尔-弗伦克尔机制)和电阻退化。最后一个被归因于离子扩散在电介质和遵循空间电荷限制(SCL)理论。根据物理表征,电阻下降的原因是氧空位迁移
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Leakage current variation with time in Ta2O5 MIM and MIS capacitors
In this paper Ta2O5 current instability in MIM and MIS capacitors is studied over several sample thicknesses with a current versus time measurement and a low frequency dielectric spectroscopy. Three types of phenomena is identified: polarization current (attributed to dielectric relaxation phenomena), conduction current (attributed to a Poole-Frenkel mechanism) and resistance degradation. This last one has been attributed to ionic diffusion in dielectric and follows the space-charge-limited (SCL) theory. According to physical characterization the origin of resistance degradation has been attributed to oxygen vacancies migration
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