A. Narazaki, K. Takano, K. Oku, H. Hamachi, T. Minato
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引用次数: 13
摘要
在本文中,我们提出了SAT-MOS,它实现了非凡的性能比导通电阻(Ron, sp): 6.5 m/spl Omega/mm/sup 2/ (@Vdss=30.8 V),在0.35 /spl mu/m的LSI设计规则上最小化了单元间距。这是20 V额定mosfet的最低值。在该电压等级下,制备的SAT-MOS Ron,sp与Si的比值极限达到208%。由于我们提出的SAC(浅沟槽接触)结构和工艺在源接触沟槽深度分散超过20%时具有非常大的SAC沟槽深度处理窗口,因此SAT-MOS在晶圆上保持了出色的Vdss均匀性。因此,我们可以提出SAT-MOS,它在静态正向偏置条件下具有超过100 a /mm/sup 2/的大电流能力,并且在非箝位电感开关(UIS)期间具有超过25 a /mm/sup 2/的雪崩坚固性。
A marvelous low on-resistance 20V rated self alignment trench MOSFET (SAT-MOS) in a 0.35/spl mu/m LSI design rule with both high forward blocking voltage yield and large current capability
In this paper, we propose the SAT-MOS, which achieved marvelous performance of the specific on-resistance (Ron, sp): 6.5 m/spl Omega/mm/sup 2/ (@Vdss=30.8 V) by minimizing the unit cell pitch on a 0.35 /spl mu/m LSI design rule. This is the lowest value of 20 V rated MOSFETs ever been reported. The fabricated SAT-MOS Ron,sp ratio to the Si limit reaches the ultimate value of 208% in this voltage class. The SAT-MOS maintains an excellent Vdss uniformity on a wafer, because our proposed SAC (shallow trench contact) structure and procedure has a very large process window for SAC trench depth if the source contact trench depth disperses more than 20%. As a result, we could present the SAT-MOS, which has both a large current capability of over 100 A/mm/sup 2/ in a static forward bias condition and an avalanche ruggedness of over 25 A/mm/sup 2/ during unclamped inductive switching (UIS).