TSAREME是评估亚微米技术辐射硬度的综合工具

W. Atkinson, D. Hansen, D. Sunderland, W. Seidler
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引用次数: 1

摘要

应用波音公司开发的微电子总空间和大气辐射效应模型(TSAREME)来评估亚微米集成电路(ic)对造成单事件效应(see)的空间辐射的硬度。TSAREME计算出的软错误率(SER)与地球同步轨道上0.25微米SRAM节点的实测值精确到6%。结果表明,当只对活性硅体积(SV)进行建模时,SER可被高估约4倍,这表明SV周围组件中的材料吸收了大部分离子(约3/4)。分析结果表明,当只考虑SV时,考虑二次离子的贡献,太阳极小期的SER值增加了60%。当整个节点建模时,当包括二次离子时,SERs仅增加了15%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
TSAREME, a comprehensive tool in evaluating radiation hardness of submicron technologies
The model Total Space and Atmospheric Radiation Effects on Microelectronics (TSAREME) developed at Boeing was applied in evaluating the hardness of submicron integrated circuits (ICs) to space radiation causing single event effects (SEEs). TSAREME computed the Soft Error Rate (SER) as accurate as 6% to measured values of a 0.25 micron SRAM node in geosynchronous orbit. Results indicated that the SER can be overestimated by a factor of ~4 when only the active silicon volume (SV) is modeled, indicating that materials in components surrounding the SV absorb a large fraction (~3/4) of the ions. Also, analysis results indicated that the SER values at solar minimum increased by 60% when the contributions from secondary ions are included when only the SV was considered. When the entire node was modeled, the SERs increased by only 15% when secondary ions were included.
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