{"title":"迈向完整的血浆诊断系统","authors":"Z. Wu, C. Spanoc","doi":"10.1109/ISSM.2001.962933","DOIUrl":null,"url":null,"abstract":"Plasma etching signals arising from three different sources are collected and analyzed, including optical emission spectroscopy (OES), RF power fundamental and harmonic information, and machine signals such as power, chamber pressure, temperature, gas flow rate, etc. CF/sub 2/ OES lines 275 nm and 321 nm are found to be better than any other signals for poly-etch endpoint detection. In addition, excellent statistical models for wafer state prediction are obtained by linear stepwise regression on all available signals. Finally a data exploration system, based on syntactic analysis, is developed for efficiently browsing the data archive, allowing users to examine the data both qualitatively and quantitatively.","PeriodicalId":356225,"journal":{"name":"2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203)","volume":"23 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2001-10-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Towards a complete plasma diagnostic system\",\"authors\":\"Z. Wu, C. Spanoc\",\"doi\":\"10.1109/ISSM.2001.962933\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Plasma etching signals arising from three different sources are collected and analyzed, including optical emission spectroscopy (OES), RF power fundamental and harmonic information, and machine signals such as power, chamber pressure, temperature, gas flow rate, etc. CF/sub 2/ OES lines 275 nm and 321 nm are found to be better than any other signals for poly-etch endpoint detection. In addition, excellent statistical models for wafer state prediction are obtained by linear stepwise regression on all available signals. Finally a data exploration system, based on syntactic analysis, is developed for efficiently browsing the data archive, allowing users to examine the data both qualitatively and quantitatively.\",\"PeriodicalId\":356225,\"journal\":{\"name\":\"2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203)\",\"volume\":\"23 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2001-10-08\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISSM.2001.962933\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSM.2001.962933","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Plasma etching signals arising from three different sources are collected and analyzed, including optical emission spectroscopy (OES), RF power fundamental and harmonic information, and machine signals such as power, chamber pressure, temperature, gas flow rate, etc. CF/sub 2/ OES lines 275 nm and 321 nm are found to be better than any other signals for poly-etch endpoint detection. In addition, excellent statistical models for wafer state prediction are obtained by linear stepwise regression on all available signals. Finally a data exploration system, based on syntactic analysis, is developed for efficiently browsing the data archive, allowing users to examine the data both qualitatively and quantitatively.
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