J. Dowsett, D.F.G. Dwyer, F. Stern, R. Heinecke, A. Truelove
{"title":"体波和表面波器件的蚀刻加工","authors":"J. Dowsett, D.F.G. Dwyer, F. Stern, R. Heinecke, A. Truelove","doi":"10.1109/FREQ.1985.200860","DOIUrl":null,"url":null,"abstract":"Etch processing of bulk wave devices is a developing technique where the upper frequency limitation of the mechanical processes can no longer be applied. However, the use of chemical or plasma processes imposes other disciplines with regard to the quality of the material and to the mechanical processes preceding the final etch. This paper discusses the techniques and the results achieved in the manufacture of bulk wa-!e resonators up to l50 MHz in the fundamental mode using the AT-cut.","PeriodicalId":291824,"journal":{"name":"39th Annual Symposium on Frequency Control","volume":"77 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1985-05-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":"{\"title\":\"Etch Processing of Bulk and Surface Wave Devices\",\"authors\":\"J. Dowsett, D.F.G. Dwyer, F. Stern, R. Heinecke, A. Truelove\",\"doi\":\"10.1109/FREQ.1985.200860\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Etch processing of bulk wave devices is a developing technique where the upper frequency limitation of the mechanical processes can no longer be applied. However, the use of chemical or plasma processes imposes other disciplines with regard to the quality of the material and to the mechanical processes preceding the final etch. This paper discusses the techniques and the results achieved in the manufacture of bulk wa-!e resonators up to l50 MHz in the fundamental mode using the AT-cut.\",\"PeriodicalId\":291824,\"journal\":{\"name\":\"39th Annual Symposium on Frequency Control\",\"volume\":\"77 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1985-05-29\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"6\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"39th Annual Symposium on Frequency Control\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/FREQ.1985.200860\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"39th Annual Symposium on Frequency Control","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/FREQ.1985.200860","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Etch processing of bulk wave devices is a developing technique where the upper frequency limitation of the mechanical processes can no longer be applied. However, the use of chemical or plasma processes imposes other disciplines with regard to the quality of the material and to the mechanical processes preceding the final etch. This paper discusses the techniques and the results achieved in the manufacture of bulk wa-!e resonators up to l50 MHz in the fundamental mode using the AT-cut.