使用光刻胶的x射线全息术

C. Jacobsen, S. Lindaas, M. Howells
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引用次数: 0

摘要

我们使用光刻胶探测器和来自波动源的1.8-3.6 nm x射线记录了生物标本的56 nm分辨率Gabor全息图。有了这项技术,我们可以在不使用x射线透镜的情况下获得高图像分辨率;光致抗蚀剂PMMA的分辨率极限被认为在5-10 nm范围内。该技术还可以很好地利用部分相干或多模光源;与较长焦距带板扫描x射线显微镜相比,单色性要求较低,并且可以使用多个空间相干模式来记录大视场的全息图(尽管图像分辨率将受到一个模式宽度的限制)。由于图像是在重建阶段聚焦的,因此对试样的对准要求不高。从使用激光等离子体x射线源获得的光刻胶曝光的生存能力判断,我们目前的方案可能与使用x射线激光器的闪光曝光兼容。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
X-ray holography using photoresists
We have recorded 56 nm resolution Gabor holograms of biological specimens using photoresist detectors and 1.8-3.6 nm x-rays from an undulator source. With this technique, we are able to obtain high image resolution without the use of x-ray lenses; the resolution limit of the photoresist PMMA is thought to be in the 5-10 nm range. The technique also makes good use of partially coherent or multimode sources; monochromaticity requirements are eased compared to longer focal length zone-plate based scanning x-ray microscopes, and multiple spatially coherent modes can be used to record a hologram of a large field (although the image resolution will be limited by the width of one mode). Since the image is focussed in the reconstruction stage, the specimen alignment requirements are non-demanding. Judging from the survivability of photoresist exposures obtained using laser plasma x-ray sources, our current scheme may be compatible with flash exposures with x-ray lasers as they become available.
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