在1.5μm SOI上具有纳米间隙的碎片膜MEM体横向谐振器

N. D. Badila-Ciressan, M. Mazza, D. Grogg, A. Ionescu
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引用次数: 5

摘要

报道了在1.5 μ m绝缘硅(SOI)破碎膜上设计、制造和实验研究21 MHz MEM体侧谐振器(BLR)。在室温真空条件下,在20v直流偏置和低交流功率下测量质量因子高达33'000。从80k和380k两个角度研究讨论了温度对谐振频率和质量因子的影响。据报道,在80k时,具有非常高的质量因子182,000和165 kOmega的运动阻力。本文表明,高质量的因数memm谐振器可以集成在部分耗尽的薄SOI上,这表明了在未来通信应用中制造全集成的memm - cmos混合集成电路的可能性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Fragmented membrane MEM bulk lateral resonators with nano-gaps on 1.5μm SOI
The design, fabrication and experimental investigation of 21 MHz MEM bulk lateral resonators (BLR) on 1.5 mum silicon-on-insulator (SOI) fragmented membranes with 100 nm air-gaps are reported. Quality factors as high as 33'000 are measured under vacuum at room temperature, with 20 V DC bias and low AC-power. The influence of temperature on the resonance frequency and quality factor is studied and discussed from 80 K and 380 K. A very high quality factor of 182'000 and a motional resistance of 165 kOmega, are reported at 80 K. The paper shows that high-quality factor MEM resonator can be integrated on partially-depleted thin SOI, which demonstrates the possibility of making full-integrated hybrid MEM-CMOS integrated circuits for future communication applications.
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