S. Egarievwe, I. Okwechime, A. Hossain, Julius O. Jow, Zaveon M. Hales, Alexander A. Egarievwe, U. Roy, R. James
{"title":"化学处理对CdZnTe核探测器影响的比较研究","authors":"S. Egarievwe, I. Okwechime, A. Hossain, Julius O. Jow, Zaveon M. Hales, Alexander A. Egarievwe, U. Roy, R. James","doi":"10.1109/NSSMIC.2014.7431279","DOIUrl":null,"url":null,"abstract":"Room temperature semiconductor detectors such as cadmium zinc telluride (CdZnTe) are often subject to surface damage during fabrication processes, thus affecting detector performance. The surface defects are usually removed through mechanical and chemical polishing, and passivation processes. This paper compares the effects of two surface passivation chemical solutions on CdZnTe detectors. The two chemicals studied are ammonium fluoride in hydrogen peroxide (NH<sub>4</sub>F + H<sub>2</sub>O<sub>2</sub> + H<sub>2</sub>O) and potassium hydroxide in hydrogen peroxide (0.1 g of KOH + 10 ml of 30% H<sub>2</sub>O<sub>2</sub>) solutions. X-ray photoelectron spectroscopy analysis showed that the NH<sub>4</sub>F-based solution is more effective at converting Te species on the CZT wafer surfaces into a more stable TeO<sub>2</sub> layer, with values of 4.90 and 5.34 for the Te<sub>3</sub>d<sub>3/2</sub>O<sub>2</sub>/Te<sub>3</sub>d<sub>3/2</sub> and Te<sub>3</sub>d<sub>5/2</sub>O<sub>2</sub>/Te<sub>3</sub>d<sub>5/2</sub> peak-height ratios respectively, compared to the KOH-based solution which has 1.25 and 1.19 respectively. Analysis of the 59.5-keV peak of Am-241 showed that the sample passivated with the NH<sub>4</sub>F-based solution has a better energy resolution (FWHM = 9.83%) compared to the one passivated with the KOH-based solution (FWHM = 14.60%).","PeriodicalId":144711,"journal":{"name":"2014 IEEE Nuclear Science Symposium and Medical Imaging Conference (NSS/MIC)","volume":"50 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Comparative study on the effects of chemical treatments on CdZnTe nuclear detectors\",\"authors\":\"S. Egarievwe, I. Okwechime, A. Hossain, Julius O. Jow, Zaveon M. Hales, Alexander A. Egarievwe, U. Roy, R. James\",\"doi\":\"10.1109/NSSMIC.2014.7431279\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Room temperature semiconductor detectors such as cadmium zinc telluride (CdZnTe) are often subject to surface damage during fabrication processes, thus affecting detector performance. The surface defects are usually removed through mechanical and chemical polishing, and passivation processes. This paper compares the effects of two surface passivation chemical solutions on CdZnTe detectors. The two chemicals studied are ammonium fluoride in hydrogen peroxide (NH<sub>4</sub>F + H<sub>2</sub>O<sub>2</sub> + H<sub>2</sub>O) and potassium hydroxide in hydrogen peroxide (0.1 g of KOH + 10 ml of 30% H<sub>2</sub>O<sub>2</sub>) solutions. X-ray photoelectron spectroscopy analysis showed that the NH<sub>4</sub>F-based solution is more effective at converting Te species on the CZT wafer surfaces into a more stable TeO<sub>2</sub> layer, with values of 4.90 and 5.34 for the Te<sub>3</sub>d<sub>3/2</sub>O<sub>2</sub>/Te<sub>3</sub>d<sub>3/2</sub> and Te<sub>3</sub>d<sub>5/2</sub>O<sub>2</sub>/Te<sub>3</sub>d<sub>5/2</sub> peak-height ratios respectively, compared to the KOH-based solution which has 1.25 and 1.19 respectively. Analysis of the 59.5-keV peak of Am-241 showed that the sample passivated with the NH<sub>4</sub>F-based solution has a better energy resolution (FWHM = 9.83%) compared to the one passivated with the KOH-based solution (FWHM = 14.60%).\",\"PeriodicalId\":144711,\"journal\":{\"name\":\"2014 IEEE Nuclear Science Symposium and Medical Imaging Conference (NSS/MIC)\",\"volume\":\"50 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-11-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2014 IEEE Nuclear Science Symposium and Medical Imaging Conference (NSS/MIC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/NSSMIC.2014.7431279\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 IEEE Nuclear Science Symposium and Medical Imaging Conference (NSS/MIC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/NSSMIC.2014.7431279","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3
摘要
室温半导体探测器如碲化镉锌(CdZnTe)在制造过程中经常受到表面损伤,从而影响探测器的性能。表面缺陷通常通过机械和化学抛光和钝化处理去除。本文比较了两种表面钝化化学溶液对CdZnTe探测器的影响。研究的两种化学物质是过氧化氢(NH4F + H2O2 + H2O)中的氟化铵和过氧化氢(0.1 g KOH + 10 ml 30% H2O2)溶液中的氢氧化钾。x射线光电子能谱分析表明,nh4f基溶液更有效地将CZT晶圆表面的Te物质转化为更稳定的TeO2层,Te3d3/2O2/Te3d3/2和Te3d5/2O2/Te3d5/2的峰高比分别为4.90和5.34,而koh基溶液的峰高比分别为1.25和1.19。对Am-241的59.5 kev峰分析表明,nh4f溶液钝化样品的能量分辨(FWHM = 9.83%)优于koh溶液钝化样品(FWHM = 14.60%)。
Comparative study on the effects of chemical treatments on CdZnTe nuclear detectors
Room temperature semiconductor detectors such as cadmium zinc telluride (CdZnTe) are often subject to surface damage during fabrication processes, thus affecting detector performance. The surface defects are usually removed through mechanical and chemical polishing, and passivation processes. This paper compares the effects of two surface passivation chemical solutions on CdZnTe detectors. The two chemicals studied are ammonium fluoride in hydrogen peroxide (NH4F + H2O2 + H2O) and potassium hydroxide in hydrogen peroxide (0.1 g of KOH + 10 ml of 30% H2O2) solutions. X-ray photoelectron spectroscopy analysis showed that the NH4F-based solution is more effective at converting Te species on the CZT wafer surfaces into a more stable TeO2 layer, with values of 4.90 and 5.34 for the Te3d3/2O2/Te3d3/2 and Te3d5/2O2/Te3d5/2 peak-height ratios respectively, compared to the KOH-based solution which has 1.25 and 1.19 respectively. Analysis of the 59.5-keV peak of Am-241 showed that the sample passivated with the NH4F-based solution has a better energy resolution (FWHM = 9.83%) compared to the one passivated with the KOH-based solution (FWHM = 14.60%).