130nm SiGe BiCMOS的有源增强可调谐高q片上e波段谐振器

N. Singh, T. Stander
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引用次数: 0

摘要

介绍了一种高q谐振器在商用130nm SiGe BiCMOS工艺中用于e频段的仿真研究。该谐振器是一个平面四分之一波微带谐振器,使用基于HBT的负电阻电路来抵消损耗并提高卸载q因子。利用3D EM (FEM)和电路联合仿真,在83.5 GHz频率下,与未增强的卸载q因子7相比,增强的卸载q因子高达892。负电阻电路充分补偿了平面谐振器和变容管的低q因数。谐振器也被证明是连续可调的频率从82到84 GHz,在卸载q因子从7到892,同时在所有调谐状态下保持无条件的稳定性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Active enhanced tunable high-Q on-chip E-band resonators in 130nm SiGe BiCMOS
A simulation study of a high-Q resonator in a commercial 130nm SiGe BiCMOS process for E-band frequencies is presented. The resonator is a planar quarter-wave microstrip resonator that uses a HBT based negative resistance circuit to counter losses and enhance the unloaded Q-factor. Using 3D EM (FEM) and circuit co-simulation, enhanced unloaded Q-factors of up to 892 are shown at a frequency of 83.5 GHz compared to the unenhanced unloaded Q-factor of 7. The negative resistance circuit sufficiently compensates for low Q-factors of the planar resonator and the varactor. The resonator is also shown to be continuously tunable in frequency from 82 to 84 GHz, and in unloaded Q-factor from 7 to 892, whilst maintaining unconditional stability in all tuning states.
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