激光烧蚀法制备ffe /sub - 3/CoSb/sub - 12/填充方角铁矿薄膜的表征

A. Suzuki
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引用次数: 0

摘要

利用脉冲激光沉积法制备了硫铁矿LaFe/ sub3 /CoSb/ sub12 /薄膜。通过选择沉积参数,获得了化学计量学的单相LaFe/sub 3/CoSb/sub 12/薄膜。薄膜由小的多晶颗粒组成,通常在20到100纳米范围内。测量了在不同沉积条件下合成的几种单相LaFe/sub 3/CoSb/sub 12/薄膜在室温下的Seebeck系数和其他电子输运性质的温度依赖性。虽然所有样品的塞贝克系数都随着温度从100 K增加到400 K而增加,但其值因薄膜合成条件的不同而不同。该膜还具有高载流子浓度(/spl sim/ 10/sup 21/ cm/sup -3/)和小迁移率(< 10 cm/sup 2//Vs)。这些结果表明,由合成条件控制的微观薄膜质量会影响它们的电子性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Characterization of filled skutterudite LaFe/sub 3/CoSb/sub 12/ thin films prepared by laser ablation
We have prepared filled skutterudite LaFe/sub 3/CoSb/sub 12/ thin films using pulsed laser deposition. Stoichiometric, single-phase LaFe/sub 3/CoSb/sub 12/ films are obtained by selecting deposition parameters. The films are composed of small polycrystalline grains typically in the 20 to 100 nm range. Temperature dependencies of the Seebeck coefficient and other electronic transport properties at room temperature were measured for several single-phase LaFe/sub 3/CoSb/sub 12/ films synthesized at different deposition conditions. Although the Seebeck coefficient increases as the temperature increases from 100 to 400 K for all samples, its value varies depending on film synthesis conditions. The films also have high carrier concentrations (/spl sim/ 10/sup 21/ cm/sup -3/) and small mobility (< 10 cm/sup 2//Vs). These results imply that microscopic film qualities controlled by synthesis conditions affect their electronic properties.
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