{"title":"超快负偏压温度不稳定性监测和使用寿命预测","authors":"Chi-Shiun Wang, Wen-Chun Chang, W. Ke, K. Su","doi":"10.1109/IRWS.2006.305228","DOIUrl":null,"url":null,"abstract":"In this paper, we propose a comprehensive solution for in-line NBTI monitor, including test structure, bias condition determination, reliability specification calculation, and lifetime projection. A smart self-heating pMOSFET has been successfully realized in 90nm standard CMOS technology. For the first time, we use channel resistance to carefully calibrate device junction temperature. Charge separation technique can precisely define NBTI cold holes regimes. No interruption adopts during our NBTI monitor stress duration, which can avoid recovery effect. Finally, the end-of-life (EoL) projection of each device, which is consistent with time-consuming package result, can be achieved by applying acceleration models. The whole monitor process of each sample can be finished within 2 minutes. This novel monitor can provide an early alert of process control diagnosis","PeriodicalId":199223,"journal":{"name":"2006 IEEE International Integrated Reliability Workshop Final Report","volume":"36 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Ultra-Fast Negative Bias Temperature Instability Monitoring and End-of-Life Projection\",\"authors\":\"Chi-Shiun Wang, Wen-Chun Chang, W. Ke, K. Su\",\"doi\":\"10.1109/IRWS.2006.305228\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, we propose a comprehensive solution for in-line NBTI monitor, including test structure, bias condition determination, reliability specification calculation, and lifetime projection. A smart self-heating pMOSFET has been successfully realized in 90nm standard CMOS technology. For the first time, we use channel resistance to carefully calibrate device junction temperature. Charge separation technique can precisely define NBTI cold holes regimes. No interruption adopts during our NBTI monitor stress duration, which can avoid recovery effect. Finally, the end-of-life (EoL) projection of each device, which is consistent with time-consuming package result, can be achieved by applying acceleration models. The whole monitor process of each sample can be finished within 2 minutes. This novel monitor can provide an early alert of process control diagnosis\",\"PeriodicalId\":199223,\"journal\":{\"name\":\"2006 IEEE International Integrated Reliability Workshop Final Report\",\"volume\":\"36 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2006-10-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2006 IEEE International Integrated Reliability Workshop Final Report\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IRWS.2006.305228\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 IEEE International Integrated Reliability Workshop Final Report","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRWS.2006.305228","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Ultra-Fast Negative Bias Temperature Instability Monitoring and End-of-Life Projection
In this paper, we propose a comprehensive solution for in-line NBTI monitor, including test structure, bias condition determination, reliability specification calculation, and lifetime projection. A smart self-heating pMOSFET has been successfully realized in 90nm standard CMOS technology. For the first time, we use channel resistance to carefully calibrate device junction temperature. Charge separation technique can precisely define NBTI cold holes regimes. No interruption adopts during our NBTI monitor stress duration, which can avoid recovery effect. Finally, the end-of-life (EoL) projection of each device, which is consistent with time-consuming package result, can be achieved by applying acceleration models. The whole monitor process of each sample can be finished within 2 minutes. This novel monitor can provide an early alert of process control diagnosis