铬注入后坡莫合金的磁阻尼增大

INTERMAG Asia 2005. Digests of the IEEE International Magnetics Conference, 2005. Pub Date : 2005-04-04 DOI:10.1109/INTMAG.2005.1464244

J. Fassbender, J. McCord, M. Weisheit, R. Mattheis

{"title":"铬注入后坡莫合金的磁阻尼增大","authors":"J. Fassbender, J. McCord, M. Weisheit, R. Mattheis","doi":"10.1109/INTMAG.2005.1464244","DOIUrl":null,"url":null,"abstract":"The static and dynamic magnetic properties of 20 nm thick permalloy films are studied as prepared and after Cr implantation with different Cr fluences. Doping results a decrease in the Curie temperature of the permalloy film with the implantation fluence. The magnetization damping is investigated by performing pulsed inductive microwave magnetometry (PIMM) for various applied magnetic fields. It is found that upon Cr implantation the PIMM amplitude decreases consistent with a decrease in the uniaxial anisotropy and a reduction in saturation magnetization. In contrast to this, a 7-fold increase of the magnetic damping is obtained for only 4% of the Cr doping.","PeriodicalId":273174,"journal":{"name":"INTERMAG Asia 2005. Digests of the IEEE International Magnetics Conference, 2005.","volume":"12 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-04-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Increased magnetic damping of permalloy upon Cr implantation\",\"authors\":\"J. Fassbender, J. McCord, M. Weisheit, R. Mattheis\",\"doi\":\"10.1109/INTMAG.2005.1464244\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The static and dynamic magnetic properties of 20 nm thick permalloy films are studied as prepared and after Cr implantation with different Cr fluences. Doping results a decrease in the Curie temperature of the permalloy film with the implantation fluence. The magnetization damping is investigated by performing pulsed inductive microwave magnetometry (PIMM) for various applied magnetic fields. It is found that upon Cr implantation the PIMM amplitude decreases consistent with a decrease in the uniaxial anisotropy and a reduction in saturation magnetization. In contrast to this, a 7-fold increase of the magnetic damping is obtained for only 4% of the Cr doping.\",\"PeriodicalId\":273174,\"journal\":{\"name\":\"INTERMAG Asia 2005. Digests of the IEEE International Magnetics Conference, 2005.\",\"volume\":\"12 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2005-04-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"INTERMAG Asia 2005. Digests of the IEEE International Magnetics Conference, 2005.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/INTMAG.2005.1464244\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"INTERMAG Asia 2005. Digests of the IEEE International Magnetics Conference, 2005.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/INTMAG.2005.1464244","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 1

摘要

研究了20nm厚坡莫合金薄膜在制备和注入Cr后的静态和动态磁性能。随着注入量的增加，坡莫合金薄膜的居里温度降低。采用脉冲感应微波磁强计(PIMM)对不同外加磁场下的磁化阻尼进行了研究。结果表明，Cr注入后，材料的单轴各向异性减小，饱和磁化强度减小。相比之下，仅4%的Cr掺杂就获得了7倍的磁阻尼增加。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

Increased magnetic damping of permalloy upon Cr implantation

The static and dynamic magnetic properties of 20 nm thick permalloy films are studied as prepared and after Cr implantation with different Cr fluences. Doping results a decrease in the Curie temperature of the permalloy film with the implantation fluence. The magnetization damping is investigated by performing pulsed inductive microwave magnetometry (PIMM) for various applied magnetic fields. It is found that upon Cr implantation the PIMM amplitude decreases consistent with a decrease in the uniaxial anisotropy and a reduction in saturation magnetization. In contrast to this, a 7-fold increase of the magnetic damping is obtained for only 4% of the Cr doping.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

INTERMAG Asia 2005. Digests of the IEEE International Magnetics Conference, 2005.

CiteScore

0.50

自引率

0.00%

发文量