紧凑重复脉冲电子束源的设计

F. Song, X. Jin, F. Li, B. Z. Zhang, G. P. Wang, C. Li, Y. Gan, H. Gong
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引用次数: 0

摘要

我们报告了一个紧凑的和重复脉冲电子束源的设计。该脉冲电子束源是在马克思技术的基础上研制的,能够长期稳定工作。该电子束源的输出电压、电流、脉冲宽度和重复频率分别为1 MV、20 kA、180 ns和1 ~ 50 Hz。相比之下,这个源的体积和重量被限制在2.5立方米和2.2吨。该源下脉冲形成网络模型的能量密度达到23 khm−3。当单次工作时,电子束源的输出电压为0.98 MV,电流为19.6 kA,功率约为19.2 GW。另一方面,该电子束源在30 Hz的重复频率下实现了0.9 MV的输出电压、18 kA的电流和16.2 GW的功率。信号源工作非常稳定,抖动为6ns。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Design of compact and repetitive pulsed e-beam source
We report on the design of a compact and repetitive pulsed e-beam source. This pulsed e-beam source, which can work stably for long time, was built based on Marx technology. The designed output voltage, current, pulse width and repetition frequency of this e-beam source is 1 MV, 20 kA, 180 ns and 1∼50 Hz, respectively. In contrast, the volume and weight of this source is limited to 2.5 m3 and 2.2 ton. The energy density of a pulse forming network model in this source attains 23 kJm−3. When working at single shots, this e-beam source gives an output voltage of 0.98 MV, current of 19.6 kA and power of approximate 19.2 GW. On the other hand, this e-beam source realizes an output voltage of 0.9 MV, current 18 kA and power 16.2 GW at a repetition frequency of 30 Hz. The source works very stable, with a jitter of 6 ns.
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