活性氢气氛下无焊剂焊接

Gregory K. Arslanian, C. Christine Dong, R. E. Patrick, Bruce Xiang, K. Wathne
{"title":"活性氢气氛下无焊剂焊接","authors":"Gregory K. Arslanian, C. Christine Dong, R. E. Patrick, Bruce Xiang, K. Wathne","doi":"10.23919/IWLPC52010.2020.9375859","DOIUrl":null,"url":null,"abstract":"A novel hydrogen activation technology based on activated hydrogen or electron attachment (EA) is developed for fluxless soldering at ambient pressure and normal soldering temperature. The technology has a potential to be used for a list of applications in the electronics packaging industry and recent work by a joint effort between Air Products and Sikama International on alpha trials of a production-scale furnace for flux-free wafer bump reflow based on electron attachment (EA).","PeriodicalId":192698,"journal":{"name":"2020 International Wafer Level Packaging Conference (IWLPC)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-10-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Fluxless Soldering in Activated Hydrogen Atmosphere\",\"authors\":\"Gregory K. Arslanian, C. Christine Dong, R. E. Patrick, Bruce Xiang, K. Wathne\",\"doi\":\"10.23919/IWLPC52010.2020.9375859\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A novel hydrogen activation technology based on activated hydrogen or electron attachment (EA) is developed for fluxless soldering at ambient pressure and normal soldering temperature. The technology has a potential to be used for a list of applications in the electronics packaging industry and recent work by a joint effort between Air Products and Sikama International on alpha trials of a production-scale furnace for flux-free wafer bump reflow based on electron attachment (EA).\",\"PeriodicalId\":192698,\"journal\":{\"name\":\"2020 International Wafer Level Packaging Conference (IWLPC)\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2020-10-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2020 International Wafer Level Packaging Conference (IWLPC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.23919/IWLPC52010.2020.9375859\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 International Wafer Level Packaging Conference (IWLPC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/IWLPC52010.2020.9375859","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

提出了一种基于活化氢或电子附着(EA)的新型氢活化技术,用于常温常压无焊剂焊接。该技术有潜力用于电子封装行业的一系列应用,最近由空气产品公司和西卡玛国际公司共同努力,对基于电子附着(EA)的无熔剂晶圆碰撞回流的生产规模炉进行了alpha试验。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Fluxless Soldering in Activated Hydrogen Atmosphere
A novel hydrogen activation technology based on activated hydrogen or electron attachment (EA) is developed for fluxless soldering at ambient pressure and normal soldering temperature. The technology has a potential to be used for a list of applications in the electronics packaging industry and recent work by a joint effort between Air Products and Sikama International on alpha trials of a production-scale furnace for flux-free wafer bump reflow based on electron attachment (EA).
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