K. Ohmuro, H. Fujishiro, M. Itoh, H. Nakamura, S. Nishi
{"title":"用于低噪声放大器的增强模伪晶倒置HEMT","authors":"K. Ohmuro, H. Fujishiro, M. Itoh, H. Nakamura, S. Nishi","doi":"10.1109/MWSYM.1991.147102","DOIUrl":null,"url":null,"abstract":"The noise characteristics of pseudomorphic inverted high electron mobility transistors (P-I-HEMTs) are reported. The P-I-HEMTs were fabricated in enhancement-mode. Compared with the pseudomorphic HEMT, the P-I-HEMT shows a lower noise figure, especially at small drain voltage and small drain current. It is concluded that the P-I-HEMT structure is suitable for fine gate low-noise FETs.<<ETX>>","PeriodicalId":263441,"journal":{"name":"1991 IEEE MTT-S International Microwave Symposium Digest","volume":"42 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1991-07-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"12","resultStr":"{\"title\":\"Enhancement-mode pseudomorphic inverted HEMT for low noise amplifier\",\"authors\":\"K. Ohmuro, H. Fujishiro, M. Itoh, H. Nakamura, S. Nishi\",\"doi\":\"10.1109/MWSYM.1991.147102\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The noise characteristics of pseudomorphic inverted high electron mobility transistors (P-I-HEMTs) are reported. The P-I-HEMTs were fabricated in enhancement-mode. Compared with the pseudomorphic HEMT, the P-I-HEMT shows a lower noise figure, especially at small drain voltage and small drain current. It is concluded that the P-I-HEMT structure is suitable for fine gate low-noise FETs.<<ETX>>\",\"PeriodicalId\":263441,\"journal\":{\"name\":\"1991 IEEE MTT-S International Microwave Symposium Digest\",\"volume\":\"42 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1991-07-10\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"12\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1991 IEEE MTT-S International Microwave Symposium Digest\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/MWSYM.1991.147102\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1991 IEEE MTT-S International Microwave Symposium Digest","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MWSYM.1991.147102","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 12
摘要
报道了伪晶倒转高电子迁移率晶体管(P-I-HEMTs)的噪声特性。在增强模式下制备p - i - hemt。与伪晶HEMT相比,P-I-HEMT表现出更低的噪声系数,特别是在小漏极电压和小漏极电流下。结果表明,P-I-HEMT结构适用于精细栅极低噪声场效应管。
Enhancement-mode pseudomorphic inverted HEMT for low noise amplifier
The noise characteristics of pseudomorphic inverted high electron mobility transistors (P-I-HEMTs) are reported. The P-I-HEMTs were fabricated in enhancement-mode. Compared with the pseudomorphic HEMT, the P-I-HEMT shows a lower noise figure, especially at small drain voltage and small drain current. It is concluded that the P-I-HEMT structure is suitable for fine gate low-noise FETs.<>