{"title":"低功耗模拟应用的深亚微米CMOS器件设计","authors":"H. Deshpande, B. Cheng, J. Woo","doi":"10.1109/VLSIT.2001.934960","DOIUrl":null,"url":null,"abstract":"Signal swing, power and device performance requirements for analog applications result in trade-offs for scaled MOSFET design. This paper presents a comprehensive study on optimization of deep sub-micron NMOS device for low power analog applications. It is shown that novel channel engineering is essential along with thin gate oxides and shallow junctions for improving the device analog performance.","PeriodicalId":232773,"journal":{"name":"2001 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.01 CH37184)","volume":"2 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2001-06-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"9","resultStr":"{\"title\":\"Deep sub-micron CMOS device design for low power analog applications\",\"authors\":\"H. Deshpande, B. Cheng, J. Woo\",\"doi\":\"10.1109/VLSIT.2001.934960\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Signal swing, power and device performance requirements for analog applications result in trade-offs for scaled MOSFET design. This paper presents a comprehensive study on optimization of deep sub-micron NMOS device for low power analog applications. It is shown that novel channel engineering is essential along with thin gate oxides and shallow junctions for improving the device analog performance.\",\"PeriodicalId\":232773,\"journal\":{\"name\":\"2001 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.01 CH37184)\",\"volume\":\"2 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2001-06-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"9\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2001 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.01 CH37184)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/VLSIT.2001.934960\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2001 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.01 CH37184)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIT.2001.934960","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Deep sub-micron CMOS device design for low power analog applications
Signal swing, power and device performance requirements for analog applications result in trade-offs for scaled MOSFET design. This paper presents a comprehensive study on optimization of deep sub-micron NMOS device for low power analog applications. It is shown that novel channel engineering is essential along with thin gate oxides and shallow junctions for improving the device analog performance.