{"title":"基于单壁碳纳米管的场效应晶体管(未评论)","authors":"H. Sharma, Z. Xiao","doi":"10.1109/SECON.2008.4494263","DOIUrl":null,"url":null,"abstract":"Summary form only given. Single-walled carbon nanotubes (SWCNTs) have been considered as a promising nanostructured material for the realization of future nanoelectronic devices because of their unique electrical properties such as the ballistic transportation of electrons or holes in SWCNTs. In this paper, we report the fabrication of single-walled carbon nanotube field- effect transistors (CNTFETs) with metal and semiconductor materials as the source and drain materials. Ultra-purified HiPCO-grown single-walled carbon nanotubes (SWCNTs) from Carbon Nanotechnologies, Inc. (CNI) were used for the fabrication of CNTFETs. N-methyl pyrrolidone (NMP), dimethyl formamide (DMF), toluene and trifluoroacetic acid were used to disperse SWCNTs in solutions. The dispersion of SWCNTs in the solvents were ultrasonically assisted, and then centrifuged at 14000 rpm. The solubility of SWCNTs in the solvents was finally compared, and the degree of dispersion was examined by SEM. Dielectrophoresis (DEP) method was used to deposit, align, and assemble carbon nanotubes (CNTs) across the source and drain of CNTFETs to form the channel. Microfabrication techniques such as UV lithography and e-beam lithography were used to fabricate the CNTFETs. The gap between the source and drain varied from 800 nm to 3 um. Both metals such as gold and semiconductors such as bismuth telluride (Bi2Te3) were used as the source and drain materials for the CNTFETs. The fabricated CNTFET has a backside gate with the substrate as the gate contact. Silicon dioxide was used as the gate oxide. Electron-beam evaporation and sputtering deposition were used for the deposition of the thin film layers in this research.The drain-source current (IDS) versus drain-source voltage (VDS) and gate voltage (VG) was characterized for the fabricated CNTFETs. It was found that the I-V behavior of metal electrode-based CNTFETs is dependent on the type (metallic or semiconducting) of aligned carbon nanotubes across the electrodes and the I-V behavior of semiconductor electrode-based CNTFETs is independent of the type of carbon nanotubes. This property makes the semiconductor electrode-based CNTFETs more promising than the metal electrode-based CNTFETs. The developed carbon nanotube field-effect transistors (CNTFETs) can be a good candidate for the application of nanoelectronics and integrated circuits with a high mobility and fast switching.","PeriodicalId":188817,"journal":{"name":"IEEE SoutheastCon 2008","volume":"11 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-04-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Single-walled carbon nanotube-based field-effect transistors (non-reviewed)\",\"authors\":\"H. Sharma, Z. 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The solubility of SWCNTs in the solvents was finally compared, and the degree of dispersion was examined by SEM. Dielectrophoresis (DEP) method was used to deposit, align, and assemble carbon nanotubes (CNTs) across the source and drain of CNTFETs to form the channel. Microfabrication techniques such as UV lithography and e-beam lithography were used to fabricate the CNTFETs. The gap between the source and drain varied from 800 nm to 3 um. Both metals such as gold and semiconductors such as bismuth telluride (Bi2Te3) were used as the source and drain materials for the CNTFETs. The fabricated CNTFET has a backside gate with the substrate as the gate contact. Silicon dioxide was used as the gate oxide. Electron-beam evaporation and sputtering deposition were used for the deposition of the thin film layers in this research.The drain-source current (IDS) versus drain-source voltage (VDS) and gate voltage (VG) was characterized for the fabricated CNTFETs. 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引用次数: 0
摘要
只提供摘要形式。单壁碳纳米管(SWCNTs)由于其独特的电学性质,如电子或空穴的弹道输运,被认为是实现未来纳米电子器件的一种有前途的纳米结构材料。本文报道了以金属和半导体材料为源极和漏极材料制备单壁碳纳米管场效应晶体管(cntfet)的方法。采用来自carbon Nanotechnologies, Inc. (CNI)的超纯化hipco生长的单壁碳纳米管(SWCNTs)制备cntfet。采用n -甲基吡咯烷酮(NMP)、二甲基甲酰胺(DMF)、甲苯和三氟乙酸分散SWCNTs。超声辅助SWCNTs在溶剂中的分散,然后在14000 rpm下离心。最后比较了SWCNTs在溶剂中的溶解度,并通过SEM检测了其分散程度。采用介电电泳(DEP)方法在cntfet的源极和漏极上沉积、排列和组装碳纳米管(CNTs)以形成通道。采用紫外光刻和电子束光刻等微细加工技术制备cntfet。源极和漏极之间的间隙从800 nm到3 um不等。金属(如金)和半导体(如碲化铋(Bi2Te3))都被用作cntfet的源极和漏极材料。所制备的CNTFET具有以基片作为栅极触点的后栅极。二氧化硅被用作栅极氧化物。本研究采用电子束蒸发和溅射沉积方法沉积薄膜层。对所制备的cntfet进行了漏源电流(IDS)与漏源电压(VDS)和栅极电压(VG)的关系表征。研究发现,金属电极基cntfet的I-V行为取决于电极上排列的碳纳米管的类型(金属或半导体),而半导体电极基cntfet的I-V行为与碳纳米管的类型无关。这一特性使得基于半导体电极的cntfet比基于金属电极的cntfet更有前景。所研制的碳纳米管场效应晶体管(cntfet)具有高迁移率和快速开关性能,是应用于纳米电子学和集成电路的良好候选者。
Summary form only given. Single-walled carbon nanotubes (SWCNTs) have been considered as a promising nanostructured material for the realization of future nanoelectronic devices because of their unique electrical properties such as the ballistic transportation of electrons or holes in SWCNTs. In this paper, we report the fabrication of single-walled carbon nanotube field- effect transistors (CNTFETs) with metal and semiconductor materials as the source and drain materials. Ultra-purified HiPCO-grown single-walled carbon nanotubes (SWCNTs) from Carbon Nanotechnologies, Inc. (CNI) were used for the fabrication of CNTFETs. N-methyl pyrrolidone (NMP), dimethyl formamide (DMF), toluene and trifluoroacetic acid were used to disperse SWCNTs in solutions. The dispersion of SWCNTs in the solvents were ultrasonically assisted, and then centrifuged at 14000 rpm. The solubility of SWCNTs in the solvents was finally compared, and the degree of dispersion was examined by SEM. Dielectrophoresis (DEP) method was used to deposit, align, and assemble carbon nanotubes (CNTs) across the source and drain of CNTFETs to form the channel. Microfabrication techniques such as UV lithography and e-beam lithography were used to fabricate the CNTFETs. The gap between the source and drain varied from 800 nm to 3 um. Both metals such as gold and semiconductors such as bismuth telluride (Bi2Te3) were used as the source and drain materials for the CNTFETs. The fabricated CNTFET has a backside gate with the substrate as the gate contact. Silicon dioxide was used as the gate oxide. Electron-beam evaporation and sputtering deposition were used for the deposition of the thin film layers in this research.The drain-source current (IDS) versus drain-source voltage (VDS) and gate voltage (VG) was characterized for the fabricated CNTFETs. It was found that the I-V behavior of metal electrode-based CNTFETs is dependent on the type (metallic or semiconducting) of aligned carbon nanotubes across the electrodes and the I-V behavior of semiconductor electrode-based CNTFETs is independent of the type of carbon nanotubes. This property makes the semiconductor electrode-based CNTFETs more promising than the metal electrode-based CNTFETs. The developed carbon nanotube field-effect transistors (CNTFETs) can be a good candidate for the application of nanoelectronics and integrated circuits with a high mobility and fast switching.