重复脉冲功率服务于纳米技术、可持续性和氢气生产

Digest of Technical Papers. PPC-2003. 14th IEEE International Pulsed Power Conference (IEEE Cat. No.03CH37472) Pub Date : 2003-06-15 DOI:10.1109/PPC.2003.1277746

E. V. van Heesch, K. Yan, A. Pemen, S. Nair, G. Winands, W. Kolkert, A. Barba

{"title":"重复脉冲功率服务于纳米技术、可持续性和氢气生产","authors":"E. V. van Heesch, K. Yan, A. Pemen, S. Nair, G. Winands, W. Kolkert, A. Barba","doi":"10.1109/PPC.2003.1277746","DOIUrl":null,"url":null,"abstract":"Repetitive pulsed-power has enormous enabling potential for a wide range of unconventional processes, such as nanotechnology, hydrogen production, gas and water processing and direct pulse interactions. The technology focuses on multiple switch concepts, a multiple pulsed plasma torch for thermal and nonthermal plasma and the combination of a near zero-erosion spark gap or an opening switch with a transmission line transformer.","PeriodicalId":143385,"journal":{"name":"Digest of Technical Papers. PPC-2003. 14th IEEE International Pulsed Power Conference (IEEE Cat. No.03CH37472)","volume":"77 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2003-06-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"Repetitive pulsed power to serve nanotechnology, sustainability and hydrogen production\",\"authors\":\"E. V. van Heesch, K. Yan, A. Pemen, S. Nair, G. Winands, W. Kolkert, A. Barba\",\"doi\":\"10.1109/PPC.2003.1277746\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Repetitive pulsed-power has enormous enabling potential for a wide range of unconventional processes, such as nanotechnology, hydrogen production, gas and water processing and direct pulse interactions. The technology focuses on multiple switch concepts, a multiple pulsed plasma torch for thermal and nonthermal plasma and the combination of a near zero-erosion spark gap or an opening switch with a transmission line transformer.\",\"PeriodicalId\":143385,\"journal\":{\"name\":\"Digest of Technical Papers. PPC-2003. 14th IEEE International Pulsed Power Conference (IEEE Cat. No.03CH37472)\",\"volume\":\"77 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2003-06-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Digest of Technical Papers. PPC-2003. 14th IEEE International Pulsed Power Conference (IEEE Cat. No.03CH37472)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/PPC.2003.1277746\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Digest of Technical Papers. PPC-2003. 14th IEEE International Pulsed Power Conference (IEEE Cat. No.03CH37472)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PPC.2003.1277746","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 5

摘要

重复脉冲功率在一系列非常规工艺中具有巨大的潜力，如纳米技术、氢气生产、天然气和水处理以及直接脉冲相互作用。该技术侧重于多开关概念，用于热等离子体和非热等离子体的多脉冲等离子炬，以及接近零腐蚀火花间隙或与传输线变压器的开路开关的组合。

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Repetitive pulsed power to serve nanotechnology, sustainability and hydrogen production

Repetitive pulsed-power has enormous enabling potential for a wide range of unconventional processes, such as nanotechnology, hydrogen production, gas and water processing and direct pulse interactions. The technology focuses on multiple switch concepts, a multiple pulsed plasma torch for thermal and nonthermal plasma and the combination of a near zero-erosion spark gap or an opening switch with a transmission line transformer.

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Digest of Technical Papers. PPC-2003. 14th IEEE International Pulsed Power Conference (IEEE Cat. No.03CH37472)

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