多层薄膜冷却装置(未经审查)

Z. Xiao
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A solid-state in-plan thin film cooling device has been fabricated using multilayered thermoelectric thin films. Bi<sub>2</sub>Te<sub>3</sub>/Sb<sub>2</sub>Te<sub>3</sub> and Bi<sub>2</sub>Te<sub>3</sub>/Bi<sub>2</sub>Te<sub>3-x</sub>Se<sub>x</sub> multilayer thin films were deposited using e-beam evaporation. Solid antimony (III) telluride and bismuth (III) telluride were evaporated to grow the Bi<sub>2</sub>Te<sub>3</sub> and Sb<sub>2</sub>Te<sub>3</sub> layers for the Bi<sub>2</sub>Te<sub>3</sub>/Sb<sub>2</sub>Te<sub>3</sub> multilayer films. Bi, Te, and Se powders were mixed with the ratio of 2:2.7:0.3 and were heated at 700degC under nitrogen and melted into solid Bi<sub>2</sub>Te<sub>3-x</sub>Se<sub>x</sub>. The thermally-grown solid Bi<sub>2</sub>Te<sub>3-x</sub>Se<sub>x</sub> was then evaporated to grow the Bi<sub>2</sub>Te<sub>3-x</sub>Se<sub>x</sub> layer for the Bi<sub>2</sub>Te<sub>3</sub>/Bi<sub>2</sub>Te<sub>3-x</sub>Se<sub>x</sub> multilayer thin film together with the Bi<sub>2</sub>Te<sub>3</sub> layer using e-beam evaporation. The Bi<sub>2</sub>Te<sub>3</sub>/Sb<sub>2</sub>Te<sub>3</sub> and Bi<sub>2</sub>Te<sub>3</sub>/Bi<sub>2</sub>Te<sub>3-x</sub>Se<sub>x</sub> multilayer thin films have a periodic structure consisting of alternating Bi<sub>2</sub>Te<sub>3</sub> and Sb<sub>2</sub>Te<sub>3</sub> layers or Bi<sub>2</sub>Te<sub>3</sub> and Bi<sub>2</sub>Te<sub>3-x</sub>Se<sub>x</sub> layers, where each layer is about 10 nm thick. The films were analyzed by XRD, SEM, and AFM. The e-beam-grown Bi<sub>2</sub>Te<sub>3</sub>/Sb<sub>2</sub>Te<sub>3</sub> multilayered thin film has a resistivity of 7.1times10<sup>-4</sup> Omegaldrcm and an in-plan Seebeck coefficient of 110 muV/K, and the e-beam-grown Bi<sub>2</sub>Te<sub>3</sub>/Bi<sub>2</sub>Te<sub>3-x</sub>Se<sub>x</sub> multilayered thin film has a resistivity of 1.6times10<sup>-4</sup> Omegaldrcm and an in-plan Seebeck coefficient of -95 muV/K. An in-plan cooling device was fabricated with the Bi<sub>2</sub>Te<sub>3</sub>/Sb<sub>2</sub>Te<sub>3</sub> and Bi<sub>2</sub>Te<sub>3</sub>/Bi<sub>2</sub>Te<sub>3-x</sub>Se<sub>x</sub> films using the standard integrated circuit (IC) fabrication process; the cooling device is consisted of 2080 pairs of p-type and n-type elements, where each element is 200 mum long and 50 mum wide; pn junction diodes were fabricated as thermometers for the measurement of temperature difference between the two ends of device. Temperature difference was achieved between the hot and cold ends under an applied DC current. The developed in-plan cooling device can be a good candidate for the application of highly-efficient micro- cooling.","PeriodicalId":188817,"journal":{"name":"IEEE SoutheastCon 2008","volume":"8 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-04-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Multilayer thin film cooling devices (non-reviewed)\",\"authors\":\"Z. Xiao\",\"doi\":\"10.1109/SECON.2008.4494262\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Solid state thermoelectric cooling devices have been of current interest for hot-spot thermal management. Cooling hot-spots with high heat flux is becoming one of the most important technical challenges facing today's IC industry. The rising temperature limits device minimization and decreases its lifetime. 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Solid antimony (III) telluride and bismuth (III) telluride were evaporated to grow the Bi<sub>2</sub>Te<sub>3</sub> and Sb<sub>2</sub>Te<sub>3</sub> layers for the Bi<sub>2</sub>Te<sub>3</sub>/Sb<sub>2</sub>Te<sub>3</sub> multilayer films. Bi, Te, and Se powders were mixed with the ratio of 2:2.7:0.3 and were heated at 700degC under nitrogen and melted into solid Bi<sub>2</sub>Te<sub>3-x</sub>Se<sub>x</sub>. The thermally-grown solid Bi<sub>2</sub>Te<sub>3-x</sub>Se<sub>x</sub> was then evaporated to grow the Bi<sub>2</sub>Te<sub>3-x</sub>Se<sub>x</sub> layer for the Bi<sub>2</sub>Te<sub>3</sub>/Bi<sub>2</sub>Te<sub>3-x</sub>Se<sub>x</sub> multilayer thin film together with the Bi<sub>2</sub>Te<sub>3</sub> layer using e-beam evaporation. 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引用次数: 0

摘要

固态热电冷却装置已成为热点热管理的热点。具有高热流密度的冷却热点是当今集成电路行业面临的最重要的技术挑战之一。升高的温度限制了器件的最小化并降低了其使用寿命。热电效应是在材料中沿温度梯度产生的电场。相反的效应,被称为珀尔帖效应,可以用于制冷,它利用电力将热量从冷端泵到热端。在本文中,我们报告了利用多层Bi2Te3/Sb2Te3和Bi2Te3/Bi2Te3- xsex薄膜制作平面固态热电冷却装置。利用多层热电薄膜制备了一种固态平面薄膜冷却装置。采用电子束蒸发法制备了Bi2Te3/Sb2Te3和Bi2Te3/Bi2Te3- xsex多层薄膜。蒸发固体碲化锑(III)和碲化铋(III)生长Bi2Te3和Sb2Te3膜,制备Bi2Te3/Sb2Te3多层膜。将Bi、Te、Se粉末按2:27:0.3的比例混合,在氮气下700℃加热,熔化成固体Bi2Te3-xSex。然后利用电子束蒸发将热生长的固体Bi2Te3- xsex与Bi2Te3层一起蒸发生长用于Bi2Te3/Bi2Te3- xsex多层薄膜的Bi2Te3- xsex层。Bi2Te3/Sb2Te3和Bi2Te3/Bi2Te3- xsex多层薄膜具有由Bi2Te3和Sb2Te3层交替或Bi2Te3和Bi2Te3- xsex层组成的周期性结构,其中每层厚度约为10 nm。采用XRD、SEM和AFM对膜进行了分析。电子束生长的Bi2Te3/Sb2Te3多层薄膜的电阻率为7.1倍10-4 ω - drcm,面内塞贝克系数为110 μ v /K,电子束生长的Bi2Te3/Bi2Te3- xsex多层薄膜的电阻率为1.6倍10-4 ω - drcm,面内塞贝克系数为-95 μ v /K。以Bi2Te3/Sb2Te3和Bi2Te3/Bi2Te3- xsex薄膜为材料,采用标准集成电路(IC)工艺制备了平面冷却器件;所述冷却装置由2080对p型和n型元件组成,每个元件长200 μ m,宽50 μ m;制作了Pn结二极管作为温度计,用于测量器件两端的温差。在施加直流电流的情况下,在热端和冷端之间实现了温差。所研制的平面冷却装置可作为高效微冷却应用的理想选择。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Multilayer thin film cooling devices (non-reviewed)
Solid state thermoelectric cooling devices have been of current interest for hot-spot thermal management. Cooling hot-spots with high heat flux is becoming one of the most important technical challenges facing today's IC industry. The rising temperature limits device minimization and decreases its lifetime. The thermoelectric effect is the appearance of an electric field along a temperature gradient established in a material. The inverse effect, called the Peltier effect, can be used for refrigeration, which uses electricity to pump heat from the cold end to the hot end. In this paper, we report to fabricate an in-plan solid-state thermoelectric cooling device using multilayered Bi2Te3/Sb2Te3 and Bi2Te3/Bi2Te3-xSex thin films. A solid-state in-plan thin film cooling device has been fabricated using multilayered thermoelectric thin films. Bi2Te3/Sb2Te3 and Bi2Te3/Bi2Te3-xSex multilayer thin films were deposited using e-beam evaporation. Solid antimony (III) telluride and bismuth (III) telluride were evaporated to grow the Bi2Te3 and Sb2Te3 layers for the Bi2Te3/Sb2Te3 multilayer films. Bi, Te, and Se powders were mixed with the ratio of 2:2.7:0.3 and were heated at 700degC under nitrogen and melted into solid Bi2Te3-xSex. The thermally-grown solid Bi2Te3-xSex was then evaporated to grow the Bi2Te3-xSex layer for the Bi2Te3/Bi2Te3-xSex multilayer thin film together with the Bi2Te3 layer using e-beam evaporation. The Bi2Te3/Sb2Te3 and Bi2Te3/Bi2Te3-xSex multilayer thin films have a periodic structure consisting of alternating Bi2Te3 and Sb2Te3 layers or Bi2Te3 and Bi2Te3-xSex layers, where each layer is about 10 nm thick. The films were analyzed by XRD, SEM, and AFM. The e-beam-grown Bi2Te3/Sb2Te3 multilayered thin film has a resistivity of 7.1times10-4 Omegaldrcm and an in-plan Seebeck coefficient of 110 muV/K, and the e-beam-grown Bi2Te3/Bi2Te3-xSex multilayered thin film has a resistivity of 1.6times10-4 Omegaldrcm and an in-plan Seebeck coefficient of -95 muV/K. An in-plan cooling device was fabricated with the Bi2Te3/Sb2Te3 and Bi2Te3/Bi2Te3-xSex films using the standard integrated circuit (IC) fabrication process; the cooling device is consisted of 2080 pairs of p-type and n-type elements, where each element is 200 mum long and 50 mum wide; pn junction diodes were fabricated as thermometers for the measurement of temperature difference between the two ends of device. Temperature difference was achieved between the hot and cold ends under an applied DC current. The developed in-plan cooling device can be a good candidate for the application of highly-efficient micro- cooling.
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