M. Stonehouse, Yanchao Zhang, B. Guilhabert, I. Watson, E. Gu, J. Herrnsdorf, M. Dawson
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Digital Illumination in Microscale Direct-Writing Photolithography: Challenges and Trade-Offs
We explore the adaptation of existing photolithography technologies and introduce the potential for additional functionality in the form of structured light. By using a complementary metal oxide semiconductor (CMOS) controlled micropixellated light emitting diode (LED) array, features such as object recognition, tracking and characterization are possible in combination with photo-curing. We discuss the observed trade off between the delivered power density and resolution capability of the system due to the requirements of the additional features.
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