J. Matsui, H. Takahashi, N. Xie, J. Mizuno, K. Utaka
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Fabrication of silicon mold for thermal Nanoimprint Lithography
We fabricated a silicon mold for thermal Nanoimprint Lithography (NIL) with EB exposure and Deep-RIE. As a result, we obtained that including a grating whose pitch was 230nm with low roughness.
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