{"title":"法向力与擦除距离的相互作用对镀贵金属触点接触电阻的影响","authors":"I. Brockman, C.S. Sieber, R. Mroczkowski","doi":"10.1109/HOLM.1988.16099","DOIUrl":null,"url":null,"abstract":"The effects of contact normal force and wiping distance on contact resistance were evaluated for hemispherical contacts wiping on flat coupons. Hard- and soft-gold-plated coupons and palladium and gold-over-palladium contacts were used. Two types of wiping action were investigated; wiping under the full normal force of 180 g and wiping during the application of the normal force. The coupon surface conditions used were: clean, lubricated, and lubricated and dust-covered. The lubricated and dust-covered conditions was intended to provide a severe condition for wiping action to penetrate or displace. The effects of cycling were also evaluated. In most cases it was found that wiping distances on the order of <or=0.25 mm were sufficient to achieve penetration on the lubricated and dusted surfaces. Contact resistance magnitude under dry circuit conditions and stability were used as criteria to evaluate the effectiveness of the penetrating action.<<ETX>>","PeriodicalId":191800,"journal":{"name":"Electrical Contacts, 1988., Proceedings of the Thirty Fourth Meeting of the IEEE Holm Conference on Electrical Contacts","volume":"11 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"10","resultStr":"{\"title\":\"The effects of the interaction of normal force and wipe distance on contact resistance in precious metal plated contacts\",\"authors\":\"I. Brockman, C.S. Sieber, R. Mroczkowski\",\"doi\":\"10.1109/HOLM.1988.16099\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The effects of contact normal force and wiping distance on contact resistance were evaluated for hemispherical contacts wiping on flat coupons. Hard- and soft-gold-plated coupons and palladium and gold-over-palladium contacts were used. Two types of wiping action were investigated; wiping under the full normal force of 180 g and wiping during the application of the normal force. The coupon surface conditions used were: clean, lubricated, and lubricated and dust-covered. The lubricated and dust-covered conditions was intended to provide a severe condition for wiping action to penetrate or displace. The effects of cycling were also evaluated. In most cases it was found that wiping distances on the order of <or=0.25 mm were sufficient to achieve penetration on the lubricated and dusted surfaces. Contact resistance magnitude under dry circuit conditions and stability were used as criteria to evaluate the effectiveness of the penetrating action.<<ETX>>\",\"PeriodicalId\":191800,\"journal\":{\"name\":\"Electrical Contacts, 1988., Proceedings of the Thirty Fourth Meeting of the IEEE Holm Conference on Electrical Contacts\",\"volume\":\"11 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"10\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Electrical Contacts, 1988., Proceedings of the Thirty Fourth Meeting of the IEEE Holm Conference on Electrical Contacts\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/HOLM.1988.16099\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Electrical Contacts, 1988., Proceedings of the Thirty Fourth Meeting of the IEEE Holm Conference on Electrical Contacts","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/HOLM.1988.16099","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The effects of the interaction of normal force and wipe distance on contact resistance in precious metal plated contacts
The effects of contact normal force and wiping distance on contact resistance were evaluated for hemispherical contacts wiping on flat coupons. Hard- and soft-gold-plated coupons and palladium and gold-over-palladium contacts were used. Two types of wiping action were investigated; wiping under the full normal force of 180 g and wiping during the application of the normal force. The coupon surface conditions used were: clean, lubricated, and lubricated and dust-covered. The lubricated and dust-covered conditions was intended to provide a severe condition for wiping action to penetrate or displace. The effects of cycling were also evaluated. In most cases it was found that wiping distances on the order of >
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