氢化非晶硅微孔尺寸的快速光学表征:微孔尺寸与光学常数相关性的普遍适用性研究

N. Matsuki, T. Matsui, K. Michishio, B. O’Rourke, N. Oshima, A. Uedono
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引用次数: 0

摘要

最近,我们发现用正电子湮没寿命谱(PALS)测定的a-Si:H的微孔尺寸与光谱椭偏法测定的光学常数ε2;ε2峰的峰值有系统的相关关系。这表明有可能建立一种新的表征方法,使微孔的平均尺寸和密度可以很容易地通过光谱椭偏法估计。在本文中,我们展示了一个新的发现,即如果制备的a- si:H薄膜在不掺杂的情况下,在不同条件下沉积的a- si:H薄膜的微孔尺寸和ε2峰在一条相同的曲线上,甚至包括设备的种类。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Fast Optical Characterization of Microvoid Size in Hydrogenated Amorphous Silicon: Study on the Universal Applicability of the Correlation between the Microvoid Size and the Optical Constant
Recently, we have found that the microvoid size in a-Si:H, determined via positron annihilation lifetime spectroscopy (PALS), is systematically correlated with the optical constant, the peak value of ε2;ε2peak, obtained from spectroscopic ellipsometry. This indicates a possibility to establish a novel characterization method that allows the average size and density of microvoid to be estimated readily via spectroscopic ellipsometry. In this presentation, we demonstrate a new finding that the microvoid size and the ε2peak of a-Si:H films deposited under different conditions, even including the sort of apparatus, are on an identical curve if a-Si:H films are prepared without doping.
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