导电桥接随机存取存储器(CBRAM):一种非易失性多级存储器技术

C. Liaw, M. Kund, D. Schmitt-Landsiedel, I. Ruge
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引用次数: 10

摘要

研究了CBRAM作为一种NVM存储器的保留特性和多层性能。cb结的特点是光电流和光致发光。测量结果显示了CBRAM技术的长期数据保留。四能级的稳定性对应于存储两个比特的能力。可扩展性显示出合适的开关特性和面积无关的导通电阻,结尺寸可达40nm以下。介绍了CBRAM写入和电压检测的工作条件和电路。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The conductive bridging random access memory (CBRAM): A non-volatile multi-level memory technology
CBRAM is investigated as a NVM memory with respect to retention characteristics and multilevel capability. The CB-junction is characterised by photocurrent and photoluminescence. Measurement results showing the long-term data retention of the CBRAM technology are presented. The stability of four levels corresponds to the capability to store two bits. Scalability is shown with suitable switching characteristics and area-independent on-resistance down to sub 40 nm junction size. Operating conditions and circuits are introduced for CBRAM writing and voltage sensing.
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