用计算模拟和I×V曲线评价表面复合速度

Marcelo D. de Lima, T. Borrely, A. Quivy
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引用次数: 0

摘要

本文仅通过分析、模拟和比较$\ mathm {I}\次\ mathm {V}$曲线,就估算了在GaAs太阳能电池(SC)表面沉积$Al_{0.28}Ga_{0.72}As$窗口层(WL)对表面复合速度(SRV)的降低。对两个样本进行了分析,它们之间唯一的区别是WL的存在。我们分别计算了引入$Al_{0.28}Ga_{0.72}As$引起的光学变化,然后我们估计了多少性能增强是由于光学变化引起的,多少是由于SRV变化引起的。我们的估计表明SRV降低了一个数量级(从1 $\乘以$ 107 cm/s到1 $\乘以10^{6}$ cm/s)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Evaluation of Surface Recombination Velocity by Means of Computational Simulations and I×V Curves
We estimated the reduction of surface recombination velocity (SRV) resulting from the deposition of an $Al_{0.28}Ga_{0.72}As$ window layer (WL) on top of a GaAs Solar cell (SC) only by analyzing, simulating and comparing $\mathrm{I}\times \mathrm{V}$ curves. Two samples were analyzed, where the only difference between them was the presence of the WL. We separately calculated the optical changes caused by the introduction of the $Al_{0.28}Ga_{0.72}As$ and then we estimated how much of the performance enhancement was due to the optical changes and how much was due to the SRV variation. Our estimation indicated one order of magnitude reduction in SRV (from 1 $\times$ 107 cm/s to 1 $\times 10^{6}$ cm/s).
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