InSe/PMItz杂化异质结的合成及结构、表面形貌和光学性质的研究

Fatih Ünal, Merve Zurnacı, S. Demir, M. Gür, Nesrin Şener, İ. Şener
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引用次数: 1

摘要

采用物理气相沉积(PVD)方法,在电化学沉积法制备的一系列退火和未退火的InSe薄膜上生长有机PMItz半导体化合物。x射线衍射(XRD)分析表明,玻璃/ITO/InSe膜形成于六方InSe相,而玻璃/ITO/InSe(退火)膜形成于单斜In6Se7和正交In4Se3相。利用原子力显微镜(AFM)对异质结层进行了表面分析,发现异质结层具有均匀性和不同的粗糙度值。光学分析表明,薄膜退火后吸收系数增大,能带隙减小。在300-1000 nm范围内,测定了薄膜的折射率(n)、消光系数(k)、实介电常数(Er)、虚介电常数(Ei)、电导率等其他光学参数,并进行了比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
SYNTHESIS AND INVESTIGATION OF STRUCTURAL, SURFACE MORPHOLOGICAL AND OPTICAL PROPERTIES OF InSe/PMItz HYBRID HETEROJUNCTION
On a series of annealed and unannealed InSe thin films which were formerly produced by electrochemical deposition method, organic PMItz semiconductor compound was growth by physical vapour deposition (PVD) method. Structural analyses of the films carried out by X-ray diffractometry (XRD) method revealed that glass/ITO/InSe film formed in hexagonal InSe phase while glass/ITO/InSe(annealed) film formed in monoclinic In6Se7 and orthorombic In4Se3 phases. Surface analyses of the layers forming heterojunction were conducted by atomic force microscoby (AFM) and it is observed that the layers are homogenous and have different roughness values. Optical analyses of the films demonstrated that annealing of the film result with increased absorption coefficient and reduced energy band gap. Moreover, other optical parameters of the films i.e. refractive indice(n), extinction coefficient (k), real dielectric constant(Er), imaginary dielectric constant(Ei) and optical conductivity were determined and compared within 300-1000 nm range.
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