微结构液态金属薄膜的场发射

Proceedings of 17th International Symposium on Discharges and Electrical Insulation in Vacuum Pub Date : 1996-07-21 DOI:10.1109/DEIV.1996.545459

J. Mitterauer

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引用次数: 0

摘要

液态金属表面的场发射有不同的机制，如液态金属蒸气弧阴极点和液态金属电子源。在体积较大的液态金属覆盖层，这两种情况下的发射性能也分别受到水动力和电水动力效应的影响。将液态金属的覆盖范围减小到相对较薄的液态金属薄膜上，场致微观结构以及固体衬底上液态金属薄膜的固有微观结构占据主导地位，并出现了新的发射模式。具有代表性的例子是液态金属薄膜阴极(LMFC)的薄膜发射模式和微结构液态金属电子源(MILMES)的固定发射模式。在脉冲功率技术的前景应用范围内，研究了真空中阴极点和场发射极的场发射。

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Field emission from microstructured thin liquid metal films

Field emission from liquid metal surfaces occurs with different mechanisms such as liquid metal vapor arc cathode spots and liquid metal electron sources. At rather bulk liquid metal coverages, in both cases the emission performance is also affected by hydrodynamic and electrohydrodynamic effects, respectively. Reducing the liquid metal coverage to a relative thin liquid metal film, the field-induced microstructure, as well as the intrinsic microstructure of the liquid metal film on a solid substrate dominates, and new emission modes appear. Representative examples for that are the film emission mode of liquid metal film cathodes (LMFC) and the stationary emission mode of microstructured liquid metal electron sources (MILMES). Both field emission from a cathode spot as well as from a field emitter in vacuum is examined in the scope of prospective applications in pulsed power technology.

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Proceedings of 17th International Symposium on Discharges and Electrical Insulation in Vacuum

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