用LAPOS测量闪电附着过程参数

Daohong Wang, Shintaro Kuroda, N. Takagi
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引用次数: 1

摘要

利用高速光学成像系统LAPOS,我们观察了19个负CG和2个正CG的闪电附着过程。我们不仅得到了它们的梯级先导速度和通道底部附近的回冲速度,还得到了它们的回冲起始高度。负第一次回击的起始高度大多在40 m左右。峰值电流越大的回冲程初始值越高。对于一个正首冲程,其峰值电流虽然远大于所有负首冲程,但其起始高度却小于大多数负首冲程。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Lightning attachment process parameters measured by using LAPOS
Using a high speed optical imaging system called LAPOS, we have observed the lightning attachment processes of 19 negative and 2 positive CG. We have obtained not only their stepped leader speeds and the return stroke speeds near the channel bottoms, but also their return stroke initiation heights. Most of the negative first return strokes exhibited an initiation height of 40 m or so. Return strokes with bigger peak current tend to initiate higher. For one positive first stroke, although its peak current is much larger than all the negative counterparts, its initiation height is smaller than most of the negative ones.
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