基于硅衬底的GaAs/AlGaAs量子阱红外光电探测器

É. Rodriguez, K. Tan, Wang Chongwu, K. Lee, S. Wicaksono, C. Sirtori, S. Yoon, W. Qijie
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引用次数: 0

摘要

在AlGaAs/GaAs量子阱红外探测器有源区与Si衬底之间引入Ge缓冲层,降低了穿线位错密度。Si和GaAs衬底上的qwip具有相似的响应性和探测性。这项工作为CMOS兼容的片上中红外探测器铺平了道路。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Si substrate based GaAs/AlGaAs quantum well infrared photodetector with Ge buffer
Ge buffer layer was introduced between the AlGaAs/GaAs quantum well infrared photodetectors active region and Si substrate, reducing threading dislocation density. The QWIPs on both Si and GaAs substrate exhibit similar responsivity, and detectivity. This work paves the way for CMOS compatible, on-chip mid-infrared detectors.
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