S. Sengele, Hongrui Jiang, J. Booske, D. W. van der Weide, C. Kory, L. Ives
{"title":"一种选择性金属化、微加工的w波段弯曲线行波管电路","authors":"S. Sengele, Hongrui Jiang, J. Booske, D. W. van der Weide, C. Kory, L. Ives","doi":"10.1109/IVELEC.2008.4556322","DOIUrl":null,"url":null,"abstract":"The development of a selective metallization process capable of metallizing only the top of a microfabricated, raised meander line ridge is described. This fabrication process has unique potential in the development of millimetre-wave and terahertz regime slow wave structures for travelling wave tubes. The fabrication process will be described and the latest images and measured data will be presented.","PeriodicalId":113971,"journal":{"name":"2008 IEEE International Vacuum Electronics Conference","volume":"14 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-04-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"17","resultStr":"{\"title\":\"A selectively metallized, microfabricated W-band meander line TWT circuit\",\"authors\":\"S. Sengele, Hongrui Jiang, J. Booske, D. W. van der Weide, C. Kory, L. Ives\",\"doi\":\"10.1109/IVELEC.2008.4556322\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The development of a selective metallization process capable of metallizing only the top of a microfabricated, raised meander line ridge is described. This fabrication process has unique potential in the development of millimetre-wave and terahertz regime slow wave structures for travelling wave tubes. The fabrication process will be described and the latest images and measured data will be presented.\",\"PeriodicalId\":113971,\"journal\":{\"name\":\"2008 IEEE International Vacuum Electronics Conference\",\"volume\":\"14 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2008-04-22\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"17\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2008 IEEE International Vacuum Electronics Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IVELEC.2008.4556322\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2008 IEEE International Vacuum Electronics Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IVELEC.2008.4556322","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A selectively metallized, microfabricated W-band meander line TWT circuit
The development of a selective metallization process capable of metallizing only the top of a microfabricated, raised meander line ridge is described. This fabrication process has unique potential in the development of millimetre-wave and terahertz regime slow wave structures for travelling wave tubes. The fabrication process will be described and the latest images and measured data will be presented.