{"title":"SOI SRAM存储单元的超低电压设计考虑","authors":"O. Thomas, A. Amara","doi":"10.1109/ISCAS.2005.1465531","DOIUrl":null,"url":null,"abstract":"This paper introduces a systematic design methodology dedicated to partially depleted SOI (PD-SOI) SRAM memory cells. We have adapted the conventional design methods in order to take into account the secondary effects that are related to the PD-SOI floating body transistor. The method has been applied both to a conventional 6-transistor SRAM cell and a 4-transistor self-refresh cell we have developed. Comparisons based on simulations using a 130 nm PD-SOI technology are presented.","PeriodicalId":191200,"journal":{"name":"2005 IEEE International Symposium on Circuits and Systems","volume":"33 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-05-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"Ultra low voltage design considerations of SOI SRAM memory cells\",\"authors\":\"O. Thomas, A. Amara\",\"doi\":\"10.1109/ISCAS.2005.1465531\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper introduces a systematic design methodology dedicated to partially depleted SOI (PD-SOI) SRAM memory cells. We have adapted the conventional design methods in order to take into account the secondary effects that are related to the PD-SOI floating body transistor. The method has been applied both to a conventional 6-transistor SRAM cell and a 4-transistor self-refresh cell we have developed. Comparisons based on simulations using a 130 nm PD-SOI technology are presented.\",\"PeriodicalId\":191200,\"journal\":{\"name\":\"2005 IEEE International Symposium on Circuits and Systems\",\"volume\":\"33 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2005-05-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2005 IEEE International Symposium on Circuits and Systems\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISCAS.2005.1465531\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2005 IEEE International Symposium on Circuits and Systems","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISCAS.2005.1465531","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Ultra low voltage design considerations of SOI SRAM memory cells
This paper introduces a systematic design methodology dedicated to partially depleted SOI (PD-SOI) SRAM memory cells. We have adapted the conventional design methods in order to take into account the secondary effects that are related to the PD-SOI floating body transistor. The method has been applied both to a conventional 6-transistor SRAM cell and a 4-transistor self-refresh cell we have developed. Comparisons based on simulations using a 130 nm PD-SOI technology are presented.