嵌入式非易失性存储器中快速充电损耗机制的可靠性问题

P. Mora, S. Renard, G. Bossu, P. Waltz, G. Pananakakis, G. Ghibaudo
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引用次数: 7

摘要

在这项工作中,我们报告了嵌入式非易失性存储器中电荷损失的深入研究。我们关注的是快速初始阈值电压(Vth)移位,它发生在数据保留烘烤的前几分钟。为了更好地理解这一现象,人们进行了实验。因此,我们可以预测在250℃下烘烤的电池的第v次位移,并评估其对产品可靠性的影响。这是该可靠性方面第一次具有如此高的准确性。基于这些观察结果,提出了一个描述快速初始阈值电压漂移的物理模型
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Reliability issues related to Fast Charge Loss Mechanism in Embedded Non Volatile Memories
In this work, we report on a thorough study of charge loss in embedded non volatile memories. We focused on the fast initial threshold voltage (Vth) shift, which occurs during the first minutes of data retention bake. Experiments were performed to have a better understanding of this phenomenon. As a result, we can predict the Vth shift of a cell baked at 250degC and evaluate its impact on product reliability. This is the first time that this reliability aspect is characterized with such a level of accuracy. Based on these observations, a physical model is proposed to describe the fast initial threshold voltage shift
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