无结晶体管中霍尔和有效迁移率的低温特性

Min-Kyu Joo, M. Mouis, B. Piot, S. Barraud, M. Shin, Gyu-Tae Kim, G. Ghibaudo
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引用次数: 1

摘要

本文首次报道了n型无结晶体管(jlt)在低温(T=100K)下的霍尔和有效迁移率特性。为此,分别从考虑平带(VFB)位置和分裂电容电压(CV)的JLT电荷解析模型中提取有效迁移率(μEff)。此外,为了直接确定表面载流子密度(Ns)和相应的霍尔迁移率(μHall),进行了霍尔效应测量,并与μEff进行了比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Low-temperature characterization of hall and effective mobility in junctionless transistors
The Hall and effective mobility characteristics of n-type junctionless transistors (JLTs) at low temperature (T=100K) are reported here for the first time. To this end, the effective mobility values (μEff) were extracted from the charge based analytical model of JLT with account for flat-band (VFB) position and split capacitance-to-voltage (CV), respectively. Besides, in order to directly determine the surface carrier density (Ns) and corresponding Hall mobility (μHall) Hall Effect measurements were carried out and compared to μEff.
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