纳米级器件的电热建模

D. Vasileska, K. Raleva, S. Goodnick
{"title":"纳米级器件的电热建模","authors":"D. Vasileska, K. Raleva, S. Goodnick","doi":"10.1109/MIEL.2010.5490455","DOIUrl":null,"url":null,"abstract":"In this paper we present simulation results obtained with our electro-thermal device simulator when modeling different technology generations of FD-SOI devices. In particular, we stress out the importance of the temperature boundary conditions for digital and analog circuits and the use of the full model which takes into account both temperature and thickness dependence (which is particularly important for thin silicon films) of the thermal conductivity.","PeriodicalId":330522,"journal":{"name":"2009 15th International Workshop on Thermal Investigations of ICs and Systems","volume":"92 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-11-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Electro-thermal modeling of nano-scale devices\",\"authors\":\"D. Vasileska, K. Raleva, S. Goodnick\",\"doi\":\"10.1109/MIEL.2010.5490455\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper we present simulation results obtained with our electro-thermal device simulator when modeling different technology generations of FD-SOI devices. In particular, we stress out the importance of the temperature boundary conditions for digital and analog circuits and the use of the full model which takes into account both temperature and thickness dependence (which is particularly important for thin silicon films) of the thermal conductivity.\",\"PeriodicalId\":330522,\"journal\":{\"name\":\"2009 15th International Workshop on Thermal Investigations of ICs and Systems\",\"volume\":\"92 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2009-11-20\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2009 15th International Workshop on Thermal Investigations of ICs and Systems\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/MIEL.2010.5490455\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 15th International Workshop on Thermal Investigations of ICs and Systems","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MIEL.2010.5490455","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

本文介绍了利用电热器件模拟器对不同技术代FD-SOI器件进行建模时得到的仿真结果。特别地,我们强调了温度边界条件对数字和模拟电路的重要性,以及考虑到热导率的温度和厚度依赖(这对硅薄膜特别重要)的完整模型的使用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Electro-thermal modeling of nano-scale devices
In this paper we present simulation results obtained with our electro-thermal device simulator when modeling different technology generations of FD-SOI devices. In particular, we stress out the importance of the temperature boundary conditions for digital and analog circuits and the use of the full model which takes into account both temperature and thickness dependence (which is particularly important for thin silicon films) of the thermal conductivity.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信