标准0.16μm CMOS中为1.1V电源提供的0.0025mm2带隙基准电压

A. Annema, G. Goksun
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引用次数: 48

摘要

今天的集成电路通常采用一个带隙电压参考(BGVR)电路来产生一个定义良好的电压,该电压在该集成电路的许多地方重复使用。经典的BGVR产生的参考电压略大于材料带隙:硅略高于1200mV。对于深亚微米技术,电源电压与材料带隙大致相同,这阻止了使用经典的带隙结构。作为一种解决方案,发明了许多创建sub-1V的BGVR拓扑;它们大多基于Banba[1]介绍的结构,也有一些采用电阻分压[2]或电压平均[3]。对于低功耗操作,在所有这些技术中都必须使用高欧姆电阻(占用很大的面积!),导致功耗和芯片面积之间的直接权衡。这种权衡可以防止在需要参考电压的地方产生参考电压:功率损失或面积损失都会太大。不需要高欧姆电阻的替代拓扑通常是基于阈值电压的非bgvr电路,因此需要微调以实现低扩展。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A 0.0025mm2 bandgap voltage reference for 1.1V supply in standard 0.16μm CMOS
Todays ICs usually employ one bandgap voltage reference (BGVR) circuit to generate a well defined voltage that is reused at many places in that IC. The classical BGVR generates a reference voltage that is slightly larger than the material bandgap: a little above 1200mV in silicon. For deep-sub-micron technologies the supply voltage is about the same as the material bandgap which prevents using the classical bandgap structure. As a solution a number of BGVR topologies that create a sub-1V are invented; most of them are based on the structure introduced by Banba [1], some are using resistive voltage division [2] or voltage averaging [3]. For low-power operation high-ohmic resistors (occupying a large area!) must be used in all these techniques, leading to an immediate trade-off between power consumption and chip-area. This trade-off prevents the local generation of reference voltages where they are required: either the power penalty or the area penalty would be too significant. Alternative topologies that do not require high-ohmic resistors typically are not-BGVR-based circuits relying on threshold voltages and hence require trimming to achieve low spread.
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