T. Suemasu, M. Takauji, T. Sunohara, C. Li, F. Hasegawa
{"title":"分子束外延生长/spl β /-FeSi/亚2/活性区硅基发光二极管及表征","authors":"T. Suemasu, M. Takauji, T. Sunohara, C. Li, F. Hasegawa","doi":"10.1109/GROUP4.2004.1416635","DOIUrl":null,"url":null,"abstract":"Si p-n junction light-emitting diodes with /spl beta/-FeSi/sub 2/ particles and with a /spl beta/-FeSi/sub 2/ continuous film active region were grown on Si(001) and Si(111) substrates, respectively, by molecular beam epitaxy and the electroluminescence properties were investigated.","PeriodicalId":299690,"journal":{"name":"First IEEE International Conference on Group IV Photonics, 2004.","volume":"52 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Growth and characterization of Si-based light-emitting diode with /spl beta/-FeSi/sub 2/ active region by molecular beam epitaxy\",\"authors\":\"T. Suemasu, M. Takauji, T. Sunohara, C. Li, F. Hasegawa\",\"doi\":\"10.1109/GROUP4.2004.1416635\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Si p-n junction light-emitting diodes with /spl beta/-FeSi/sub 2/ particles and with a /spl beta/-FeSi/sub 2/ continuous film active region were grown on Si(001) and Si(111) substrates, respectively, by molecular beam epitaxy and the electroluminescence properties were investigated.\",\"PeriodicalId\":299690,\"journal\":{\"name\":\"First IEEE International Conference on Group IV Photonics, 2004.\",\"volume\":\"52 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2004-09-29\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"First IEEE International Conference on Group IV Photonics, 2004.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/GROUP4.2004.1416635\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"First IEEE International Conference on Group IV Photonics, 2004.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/GROUP4.2004.1416635","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Growth and characterization of Si-based light-emitting diode with /spl beta/-FeSi/sub 2/ active region by molecular beam epitaxy
Si p-n junction light-emitting diodes with /spl beta/-FeSi/sub 2/ particles and with a /spl beta/-FeSi/sub 2/ continuous film active region were grown on Si(001) and Si(111) substrates, respectively, by molecular beam epitaxy and the electroluminescence properties were investigated.