消除电路内反射的植入工艺

H. Stinehelfer
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引用次数: 0

摘要

本文将描述在实验测量中植入理论反射以消除结电容的方法。时域分析将用于检查电路内部发生的情况,使用频率域表示“植入物”。植入过程是在一组测量上进行的,以便对电路进行更详细的检查。理论上的电路可以是电容式的、电感式的,也可以是给定位置的阻抗变化。这种技术可以通过实验改变测量数据。与进行物理调优更改相比,该过程成本更低,速度更快。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Implantation Process for Removing a Reflection Inside a Circuit
This paper wi1l describe the use of implanting a theoretical reflection inside an experimental measurement to remove a junction capacitance. Time domain analysis will be used to examine what is happening inside the circuit using the frequency domain representation for the "Implant". The implant process is performed on a set of measurements to allow more detailed examination of the circuit. The theoretical circuit can be capacitive, inductive or an impedance change at a given location. This technique can allow the measured date to be experimentally changed. The procees is less expensive and faster than making physical tuning changes.
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