一个3D系统原型的eDRAM缓存堆叠在类似处理器的逻辑使用硅通孔

M. Wordeman, J. Silberman, G. Maier, M. Scheuermann
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引用次数: 48

摘要

3D集成(3DI)通过增加互连带宽,有望改善集成系统的性能。堆叠高速缓存的处理器是3DI[2]的一个潜在应用。这项工作描述了3D系统原型的设计和操作,该系统通过堆叠内存层构建,内存层由eDRAM[3]和IBM Power7™处理器L3缓存的逻辑块构建,以及45纳米CMOS技术[4]中的“处理器代理”层,该技术增强了通硅过口(tsv)[5]。与之前报道的3D eDRAM[6]不同,本文描述的3D堆栈是使用50μm间距μC4将一个厚芯片的正面连接到薄芯片背面的TSV连接。tsv由直径约20μm、深度< 100μm的cu填充过孔组成。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A 3D system prototype of an eDRAM cache stacked over processor-like logic using through-silicon vias
3D integration (3DI) holds promise for improved performance of integrated systems by increasing interconnect bandwidth [1]. A processor stacked with cache memory is one potential application of 3DI [2]. This work describes the design and operation of a prototype of a 3D system, constructed by stacking a memory layer, built with eDRAM [3] and logic blocks from the IBM Power7™ processor L3 cache, and a “processor proxy” layer in 45nm CMOS technology [4] enhanced to include through-silicon vias (TSVs) [5]. Unlike the previously reported 3D eDRAM [6], the 3D stack described here is constructed using 50μm pitch μC4's joining the front side of one thick chip to TSV connections on the back side of a thinned chip. TSVs are formed of Cu-filled vias that are ~20μm in diameter and <;100μm deep [5].
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