39th ARFTG Conference Digest最新文献

VNA S11 Uncertainty Measurement a Comparison of Three Techniques VNA S11不确定度测量——三种技术的比较

39th ARFTG Conference Digest Pub Date : 1992-06-05 DOI: 10.1109/ARFTG.1992.326976

B. Oldfield

引用次数: 16

GaAs MMIC Probe Measurements and Calibration Techniques GaAs MMIC探针测量和校准技术

39th ARFTG Conference Digest Pub Date : 1992-06-05 DOI: 10.1109/ARFTG.1992.326977

J. Penn, C. Moore

{"title":"GaAs MMIC Probe Measurements and Calibration Techniques","authors":"J. Penn, C. Moore","doi":"10.1109/ARFTG.1992.326977","DOIUrl":"https://doi.org/10.1109/ARFTG.1992.326977","url":null,"abstract":"The MMlC designer has several options available to verify the performance and simulation agreement of his circuits. They can be divided into two basic categories: calibration reference plane at the probe tips or on the MMIC chip at the coplanar interface to the device under test (DUT). The calibration technique used determines the reference plane of the measurements. Several on-wafei and off-wafer calibration techniques were used to obtain measurements of GaAs MMICs. A Wafer Probe station and a vector network analyzer were used to obtain LRM, SOLT, and TRL calibrated measurements of GaAs devices. In order to use on wafer calibration, an open, a short, a load, a \"short\" microstrip line, and a \"long\" microstrip line were designed and included on the GaAs wafer. An SOLT and a TRL calibration was performed with these on-wafer calibration standards. For off-wafer calibration, the Cascade Microtech Impedance Standard Substrate (ISS) was used to obtain an LRM calibration for a third set of measurements. To equalize the reference plane of the LRM measurements with the on-wafer TRL and SOLT calibration measurements, the MMlC launches which transition from the coplanar probe to the microstrip were subtracted out, i.e. deembeded to equalize the reference plane. A numerical technique was used to extract the approximate s-parameters of the MMIC launch from LRM measured data. Device measurements with all three calibration techniques closely agreed and were repeatable. These deembeded measurements compared favorably to foundry supplied device models.","PeriodicalId":220587,"journal":{"name":"39th ARFTG Conference Digest","volume":"9 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-06-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133609021","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 2

Characterization of Calibration Standards by Physical Measurements 用物理测量来描述校准标准

39th ARFTG Conference Digest Pub Date : 1992-06-05 DOI: 10.1109/ARFTG.1992.326972

K. H. Wong

引用次数: 20

Production Worthiness of a GaAs Wafer FAB as Demonstrated Through Automated RF Probe Measurements 通过自动射频探针测量证明GaAs晶圆FAB的生产价值

39th ARFTG Conference Digest Pub Date : 1992-06-05 DOI: 10.1109/ARFTG.1992.326968

A. Lum

引用次数: 1

Measurement Set-Up for High-Frequency Characterization of Planar Contact Devices 平面接触器件高频特性的测量装置

39th ARFTG Conference Digest Pub Date : 1992-06-01 DOI: 10.1109/ARFTG.1992.326969

P. Degraeuwe, L. Martens, D. De Zutter

引用次数: 10

S-Parameter, I-V Curve and Noise Figure Measurements of III-V Devices at Cryogenic Temperatures 低温下III-V器件的s参数、I-V曲线和噪声系数测量

39th ARFTG Conference Digest Pub Date : 1992-06-01 DOI: 10.1109/ARFTG.1992.326974

C. Wilker, P. Pang, C. F. Carter, Z. Shen

引用次数: 2

Local Oscillator Noise Affects Noise Figure Measurement Accuracy 本振噪声影响噪声系数测量精度

39th ARFTG Conference Digest Pub Date : 1992-06-01 DOI: 10.1109/ARFTG.1992.326975

S. Yates

引用次数: 0

A Simple Calibrator for Noise Figure/Gain Meters 一个简单的校正噪声系数/增益计

39th ARFTG Conference Digest Pub Date : 1992-06-01 DOI: 10.1109/ARFTG.1992.326973

R. Lane

引用次数: 0

Measurement Accuracies for Various Techniques for Measuring Amplifier Noise 测量放大器噪声的各种技术的测量精度

39th ARFTG Conference Digest Pub Date : 1992-06-01 DOI: 10.1109/ARFTG.1992.326971

D. Wait

引用次数: 3

MMIC Reflection Coefficient Synthesizer For On-Wafer Noise Parameter Extraction 用于片上噪声参数提取的MMIC反射系数合成器

39th ARFTG Conference Digest Pub Date : 1992-06-01 DOI: 10.1109/ARFTG.1992.326970

M. Dydyk

{"title":"MMIC Reflection Coefficient Synthesizer For On-Wafer Noise Parameter Extraction","authors":"M. Dydyk","doi":"10.1109/ARFTG.1992.326970","DOIUrl":"https://doi.org/10.1109/ARFTG.1992.326970","url":null,"abstract":"This paper will summarize Noise Parameter Extraction Methods, discuss their limitations and present a novel approach to improving accuracy by incorporating an MMIC reflection coefficient synthesizer into Coplanar Waveguide probe. Products offered by ATN and Cascade Microtech, Inc. that permit automated noise parameter measurements on wafer are limited in accuracy because the variable source impedance necessary for proper operation of the system is connected through a probe which exhibits loss. This loss limits the maximum reflection coefficient presented to the device under test (DUT) and consequently impacts the accuracy of measurements as frequency increases. The reason for this stems from the manner the parameters are extracted. If all the reflection coefficients (or source admittances) presented (by the reflection coefficient synthesizer) are far removed from the optimum, the accuracy of predicting Fmin by extrapolation will suffer. If the accuracy of Fmin becomes questionable, so will the other parameters. To obtain a higher degree of accuracy and increase the diagnostic frequency, it is necessary to imbed the reflection coefficient synthesizer in the RF probe which is the subject of this paper. This is done primarily to reduce losses and take full advantage of the variable source generator capability. In addition, provisions have to be made to introduce a Noise Source into the system. This paper will address the implementation of such a reflection coefficient synthesizer using MMIC technology, compare simulated vs experimental results and discuss future plans.","PeriodicalId":220587,"journal":{"name":"39th ARFTG Conference Digest","volume":"13 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122668834","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 6