Microstructural Characterization and Growth Kinetics of the Reaction Layer in U-10wt% Zr/Zircaloy-4 Diffusion Couples

IF 0.6 4区材料科学 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY

稀有金属材料与工程 Pub Date : 2018-09-01 DOI:10.1016/S1875-5372(18)30208-X

Zhang Yuting , Wang Xin , Liu Pengchuang , Zeng Gang , Pang Xiaoxuan , Jia Jianping , Sheng Liusi , Zhang Pengcheng

{"title":"Microstructural Characterization and Growth Kinetics of the Reaction Layer in U-10wt% Zr/Zircaloy-4 Diffusion Couples","authors":"Zhang Yuting , Wang Xin , Liu Pengchuang , Zeng Gang , Pang Xiaoxuan , Jia Jianping , Sheng Liusi , Zhang Pengcheng","doi":"10.1016/S1875-5372(18)30208-X","DOIUrl":null,"url":null,"abstract":"<div>To investigate the compatibility and diffusion behavior between U-Zr alloys and Zr-4 alloys, solid-to-solid U-10wt% Zr/Zr-4 diffusion couples were assembled by vacuum hot pressing and then annealed under vacuum at temperatures ranging from 580 °C to 1100 °C for various time. Scanning and transmission electron microscopes were employed to analyze the microstructures and composition profiles at the interfaces of the couples. The compatibility between the two alloys was investigated. δ-UZr2 and ∼20-nm-thin U-rich layers existed in the vacuum-hot-pressed samples. The interdiffusion coefficient constant and activation energy are found to be (4.23±0.63)×10−6 m2/s and (160.73±1.67) kJ/mol, respectively. The interdiffusion coefficients of the U-10wt% Zr/Zr-4 alloy couples are higher than those of U—Zr alloys, especially at low temperature.</div>","PeriodicalId":21056,"journal":{"name":"稀有金属材料与工程","volume":"47 9","pages":"Pages 2675-2681"},"PeriodicalIF":0.6000,"publicationDate":"2018-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/S1875-5372(18)30208-X","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"稀有金属材料与工程","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S187553721830208X","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}

引用次数: 0

Abstract

To investigate the compatibility and diffusion behavior between U-Zr alloys and Zr-4 alloys, solid-to-solid U-10wt% Zr/Zr-4 diffusion couples were assembled by vacuum hot pressing and then annealed under vacuum at temperatures ranging from 580 °C to 1100 °C for various time. Scanning and transmission electron microscopes were employed to analyze the microstructures and composition profiles at the interfaces of the couples. The compatibility between the two alloys was investigated. δ-UZr₂ and ∼20-nm-thin U-rich layers existed in the vacuum-hot-pressed samples. The interdiffusion coefficient constant and activation energy are found to be (4.23±0.63)×10⁻⁶ m²/s and (160.73±1.67) kJ/mol, respectively. The interdiffusion coefficients of the U-10wt% Zr/Zr-4 alloy couples are higher than those of U—Zr alloys, especially at low temperature.

查看原文本刊更多论文

U-10wt% Zr/Zircaloy-4扩散偶联反应层的微观结构表征和生长动力学

为了研究U-Zr合金与Zr-4合金之间的相容性和扩散行为，采用真空热压法制备了U-10wt% Zr/Zr-4扩散偶，并在580 ~ 1100℃的温度下进行了不同时间的真空退火。利用扫描电镜和透射电镜分析了偶联界面处的显微组织和成分分布。研究了两种合金的相容性。真空热压样品中存在δ-UZr2和~ 20 nm厚的富铀层。扩散系数常数和活化能分别为(4.23±0.63)×10−6 m2/s和(160.73±1.67)kJ/mol。U-10wt% Zr/Zr-4合金的互扩散系数高于U-Zr合金，特别是在低温时。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

求助全文

约1分钟内获得全文求助全文

来源期刊