Study of the Influence of Annealing Temperature on the Structural and Optical Properties of ZnTe Prepared by Vacuum Thermal Evaporation Technique

Sarmad Ali, Alia A. A. Shehab, S. A. Maki
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引用次数: 3

Abstract

The ZnTe alloy was prepared as  deposited thin films on the glass substrates at a thickness of 400±20 nm using vacuum evaporation technique at pressure (1 × 10-5) mbar and room temperature. Then the thin films under vacuum (2 × 10-3 mbar) were annealing at (RT,100 and 300) °C for one hour. The structural properties were studied by using X-ray diffraction and AFM, the results show that the thin films had approached the single crystalline in the direction (111) as preferred orientation of the structure zinc-blende for cubic type, with small peaks of tellurium (Te) element for all prepared thin films. The calculated crystallite size (Cs) decreased with the increase in the annealing temperature, from (25) nm before the annealing to (21) nm after the annealing. The images of atomic force microscopy of all thin films appeared a homogenous structure and high smoothness through roughness values ​​that increased slightly from (1.4) nm to (3.4) nm. The optical properties of the ZnTe at (RT,100 and 300) °C were studied transmittance and absorbance spectrum as a function of the wavelength. The energy gap was found about (2.4) eV for the thin films before the annealing and increased slightly to (2.5) eV after annealing at 300 °C
退火温度对真空热蒸发法制备ZnTe结构和光学性能影响的研究
采用真空蒸发技术,在压力(1 × 10-5) mbar和室温条件下,制备了厚度为400±20 nm的ZnTe合金薄膜。然后在真空(2 × 10-3 mbar)下(RT,100和300)℃下退火1小时。利用x射线衍射和原子力显微镜对其结构性质进行了研究,结果表明:制备的薄膜在立方型锌-闪锌矿结构的优选取向(111)方向上接近单晶,且所有薄膜都有碲元素的小峰。随着退火温度的升高,计算得到的晶粒尺寸Cs减小,从退火前的(25)nm减小到退火后的(21)nm。在原子力显微镜下,所有薄膜的粗糙度值从(1.4)nm略微增加到(3.4)nm,呈现出均匀的结构和较高的光滑度。研究了ZnTe在(RT,100和300)℃下的光学特性,透射率和吸光度随波长的变化规律。薄膜在退火前的能隙约为(2.4)eV, 300℃退火后的能隙略增大至(2.5)eV
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