{"title":"Interface-Engineered High-Tc Josephson Junctions","authors":"B.H Moeckly , K Char , Y Huang , K.L Merkle","doi":"10.1016/S0964-1807(98)00070-2","DOIUrl":null,"url":null,"abstract":"<div><p>We have developed a process for fabricating YBa<sub>2</sub>Cu<sub>3</sub>O<sub>7</sub> thin-film, ramp-type edge junctions in which no deposited barrier is employed. These devices display excellent RSJ-type current–voltage (<em>I</em>–<em>V</em>) characteristics with values of <em>I</em><sub>c</sub> and <em>R</em><sub>n</sub><span> tunable over a useful range for operation of digital circuits. Initial junction reproducibility and uniformity are very encouraging.</span></p></div>","PeriodicalId":100110,"journal":{"name":"Applied Superconductivity","volume":"6 7","pages":"Pages 317-323"},"PeriodicalIF":0.0000,"publicationDate":"1998-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/S0964-1807(98)00070-2","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Applied Superconductivity","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0964180798000702","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3
Abstract
We have developed a process for fabricating YBa2Cu3O7 thin-film, ramp-type edge junctions in which no deposited barrier is employed. These devices display excellent RSJ-type current–voltage (I–V) characteristics with values of Ic and Rn tunable over a useful range for operation of digital circuits. Initial junction reproducibility and uniformity are very encouraging.
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