Development of an intense surface discharge pumped vacuum ultraviolet lamp

H. Hatanaka, R. Sze
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引用次数: 0

Abstract

A large area (15 cm /spl times/15 cm) uniform vacuum ultraviolet light source employing a surface discharge pumping scheme has been developed for semiconductor processing applications. A low inductance pulsed power circuit for initiating the large area uniform surface discharge was constructed. The total stored energy in the capacitors (4.2 /spl mu/F) is 1.9 kJ when charged to 30 kV. A current pulse of 1.5 /spl mu/s with a peak of 210 kA is deposited to the discharge load from the three capacitor modules. The uniformity of the light over the large area surface discharge is 5% on the surface from visible light measurement when alumina is used as a discharge plate material.
强表面放电抽运真空紫外线灯的研制
采用表面放电泵浦方案,研制了一种用于半导体加工的大面积(15cm /spl倍/ 15cm)均匀真空紫外光源。构造了一种用于启动大面积均匀表面放电的低电感脉冲功率电路。充电至30kv时,电容器的总存储能量(4.2 /spl mu/F)为1.9 kJ。从三个电容模块的放电负载上沉积一个1.5 /spl mu/s的电流脉冲,峰值为210 kA。当使用氧化铝作为放电板材料时,可见光测量的光在大面积表面放电上的均匀性为5%。
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