PMMA photonic crystals for waveguiding applications

Abstract

This paper describes the fabrication of two- dimensional photonic crystals (PCs) obtained by direct patterning of positive PMMA electronoresist, using the electron-beam lithography technique (EBL). We design, fabricate and simulate a passive optical structure: a channel PC waveguide, to be used in integrated optic applications. The fabrication of the device is a challenge because we integrated the PC waveguide configuration with a taper optical waveguide on the same substrate. The finite difference time domain (FDTD) simulations were used to predict the optical behavior, and in particular the band gap, of the investigated structure.