Effect of Pulse Energy on the Optical Properties of ZnS Thin Films Prepared Using Pulse Laser Technique

K. M. Haroun, M. Abdalla, S. S. Elwakeel, Yousif Hassan Alsheikh Abd Alraheim
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引用次数: 1

Abstract

In these work four samples of ZnS thin films deposited on glass substrate using pulse laser deposition method with different pulse energies, the effect of the laser pulse energy on the optical properties of the four ZnS thin films fabricated was studied. Q-Switched Nd: YAG laser with the fundamental wavelength 1064 nm, laser Pulse energies of (125, 150, 175, and 200) mj with fixed number of pulses of 20, and pulse repetition rate of 5 Hz were used. The target to the substrate distance and angle were kept fixed. The film thicknesses were measured using FESEM measurement tool. The thickness of the deposited ZnS thin films was found to be linearly dependent on the pulse energy used. The transmission spectra in the tested region (532 to 915) nm were found to be in the range from 0.41 to 0.59% depending on the ZnS thin film thickness, and for each ZnS thin film the transmission spectrum is unique. The refractive indices of all samples were determined; and for each sample and it were found to change with wavelength, the highest refractive index of 5.6 at 915 nm was obtained for the sample of the smallest thickness 0.49 microns. Transmission spectra, absorption coefficients and the refractive indices they were in good agreement with the literature.
脉冲能量对脉冲激光制备ZnS薄膜光学性能的影响
本文采用脉冲激光沉积法在玻璃基板上制备了4种不同脉冲能量的ZnS薄膜样品,研究了激光脉冲能量对制备的ZnS薄膜光学性能的影响。调q Nd: YAG激光器,基波长1064 nm,激光脉冲能量分别为(125、150、175和200)mj,脉冲数固定为20,脉冲重复率为5 Hz。目标到基板的距离和角度保持固定。采用FESEM测量工具测量薄膜厚度。沉积的ZnS薄膜的厚度与脉冲能量呈线性关系。在532 ~ 915 nm范围内,随ZnS薄膜厚度的不同,透射光谱范围在0.41 ~ 0.59%之间,且每一种ZnS薄膜的透射光谱都是唯一的。测定了所有样品的折射率;在915 nm处,最小厚度为0.49微米的样品折射率最高,为5.6。透射光谱、吸收系数和折射率与文献吻合较好。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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